Low-temperature chemical vapor deposition of indium sulfide thin films using a novel single-source indium thiocarboxylate compound as precursor
1996 ◽
Vol 2
(6)
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pp. 242-244
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Keyword(s):
Keyword(s):
1990 ◽
pp. 217-222
1992 ◽
Vol 139
(4)
◽
pp. 1151-1159
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Keyword(s):
Keyword(s):
1989 ◽
Vol 24
(2)
◽
pp. 213-219
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1998 ◽
Vol 21
(1-4)
◽
pp. 355-366
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