scholarly journals The effect of pretreatment for SiH 4 gas by microwave plasma on Si film formation behavior by thermal CVD

2020 ◽  
Vol 17 (4) ◽  
pp. 1900198
Author(s):  
Keiichi Hamanaka ◽  
Norihisa Takei ◽  
Hiroaki Kakiuchi ◽  
Kiyoshi Yasutake ◽  
Hiromasa Ohmi
Keyword(s):  
Microwave Plasma ◽  
Film Formation ◽  
Thermal Cvd ◽  
Formation Behavior

Influence of mixed layer of proteins and phospholipids on the unique film formation behavior of Hevea natural rubber latex

2015 ◽  
Vol 466 ◽  
pp. 100-106 ◽  
Author(s):  
Jitladda Sakdapipanich ◽  
Ruttapoom Kalah ◽  
Adun Nimpaiboon ◽  
Chee Cheong Ho
Keyword(s):  
Natural Rubber ◽  
Mixed Layer ◽  
Film Formation ◽  
Natural Rubber Latex ◽  
Rubber Latex ◽  
Formation Behavior

Investigation on Surface-Film Formation Behavior of LiMn2 O4 Thin-Film Electrodes in LiClO4 /Propylene Carbonate

2017 ◽  
Vol 2 (10) ◽  
pp. 2895-2900 ◽  
Author(s):  
Jun-ichi Inamoto ◽  
Tomokazu Fukutsuka ◽  
Kohei Miyazaki ◽  
Takeshi Abe
Keyword(s):  
Thin Film ◽  
Propylene Carbonate ◽  
Film Formation ◽  
Surface Film ◽  
Formation Behavior ◽  
Thin Film Electrodes

Conductivity percolation of carbon nanotubes (CNT) in polystyrene (PS) latex film

2010 ◽  
Vol 88 (3) ◽  
pp. 267-276 ◽  
Author(s):  
Ş. Uğur ◽  
Ö. Yargi ◽  
Ö. Pekcan
Keyword(s):  
Carbon Nanotubes ◽  
Electrical Conductivity ◽  
Percolation Theory ◽  
Film Formation ◽  
Latex Film ◽  
Conductivity Measurements ◽  
Multiwalled Carbon ◽  
Transmission Technique ◽  
Annealing Step ◽  
Formation Behavior

In this study, the effect of multiwalled carbon nanotubes (MWNT) on film formation behaviour and electrical conductivity properties of polystrene (PS) latex film was investigated by using the photon transmission technique and electrical conductivity measurements. Films were prepared by mixing PS latex with different amounts of MWNTs, varying in the range between 0 and 20 wt%. After drying, MWNT content films were separately annealed above the glass transition temperature (Tg) of PS, ranging from 100 to 270 °C, for 10 min. To monitor film formation behavior of PS–MWNT composites, transmitted light intensity, Itr, was measured after each annealing step. The surface conductivity of annealed films at 170 °C was measured and found to increase dramatically above a certain fraction of MWNT (4 wt%) following the percolation theory. This fraction was defined as the percolation threshold of conductivity, Rc. The conductivity scales with the mass fraction of MWNT as a power law with exponent 2.27, which is extremely close to the value of 2.0 predicted by percolation theory. In addition, the increase in Itr during annealing was explained by void closure and interdiffusion processes. Film formation stages were modeled and the corresponding activation energies were measured.

Azobenzene-Containing Polyamic Acid with Excellent Langmuir−Blodgett−Kuhn Film Formation Behavior Suitable for All-Optical Switching

Langmuir ◽  
2005 ◽  
Vol 21 (15) ◽  
pp. 7036-7043 ◽  
Author(s):  
Yun Zong ◽  
Keiko Tawa ◽  
Bernhard Menges ◽  
Jürgen Rühe ◽  
Wolfgang Knoll
Keyword(s):  
Optical Switching ◽  
Film Formation ◽  
Polyamic Acid ◽  
Langmuir Blodgett ◽  
All Optical ◽  
Formation Behavior ◽  
All Optical Switching

Tribological Properties and Film Formation Behavior of Thermoreversible Gel Lubricants

2010 ◽  
Vol 53 (5) ◽  
pp. 722-730 ◽  
Author(s):  
Nobuyoshi Ohno ◽  
Sobahan Mia ◽  
Kazuo Masuhara ◽  
Kentaro Sonoda ◽  
Yuji Yamashita ◽  
...  
Keyword(s):  
Tribological Properties ◽  
Film Formation ◽  
Formation Behavior ◽  
Thermoreversible Gel

Effects of Magnetic Fields and Excited Plasma Species on Silicon Oxide Film Formation by Microwave Plasma CVD

1988 ◽  
Author(s):  
Takuya Fukuda ◽  
Kazuo Suzuki ◽  
Yasuhiro Mochizuki ◽  
Michio Ohue ◽  
Naohiro Momma ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Oxide Film ◽  
Silicon Oxide ◽  
Microwave Plasma ◽  
Film Formation ◽  
Plasma Cvd ◽  
Silicon Oxide Film ◽  
Plasma Species ◽  
Microwave Plasma Cvd

Low Temperature SiO2 Film Formation by Microwaｖe Plasma Assisted Reactive Beam Deposition

1985 ◽  
Author(s):  
Eiichi Murakami ◽  
Shin-ichiro Kimura ◽  
Terunori Warabisako ◽  
Kiyoshi Miyake ◽  
Hideo Sunami
Keyword(s):  
Low Temperature ◽  
Microwave Plasma ◽  
Film Formation ◽  
Sio2 Film ◽  
Beam Deposition

Magnesium Storage Performance and Surface Film Formation Behavior of Tin Anode Material

2016 ◽  
Vol 3 (11) ◽  
pp. 1813-1819 ◽  
Author(s):  
Dan-Thien Nguyen ◽  
Xuan Minh Tran ◽  
Joonsup Kang ◽  
Seung-Wan Song
Keyword(s):  
Anode Material ◽  
Film Formation ◽  
Surface Film ◽  
Storage Performance ◽  
Formation Behavior ◽  
Tin Anode
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