Liquid phase epitaxy (LPE) grown Bi, Ga, Al substituted iron garnets with huge Faraday rotation for magneto-optic applications

2004 ◽  
Vol 201 (7) ◽  
pp. 1398-1402 ◽  
Author(s):  
P. G�rnert ◽  
T. Aichele ◽  
A. Lorenz ◽  
R. Hergt ◽  
J. Taubert
1987 ◽  
Vol 11 (S_1_ISMO) ◽  
pp. S1_341-345 ◽  
Author(s):  
W. TOLKSDORF ◽  
H. DAMMANN ◽  
E. PROSS

2013 ◽  
Vol 200 ◽  
pp. 256-260 ◽  
Author(s):  
I.I. Syvorotka ◽  
Igor M. Syvorotka ◽  
S.B. Ubizskii

The series of (LuBi)3Fe5O12 film were grown on (111) oriented GGG substrate with diameters 1, 2 and 3 inch by liquid phase epitaxy using Bi2O3-base flux. Different types of surface morphology on the grown films were observed. The films’ surface was smooth and mirror while the film thickness was less than 13 μm and becomes rough for thickness above this value. The grown films were characterized by measuring magnetization loops and magneto-optic Faraday rotation under magnetization reversal as well as ferromagnetic resonance (FMR). All films with mirror surface demonstrate the in-plane magnetization, high Faraday rotation and FMR linewidth about 0.8 Oe at 9.1 GHz and room temperature.


2015 ◽  
Vol 107 (1) ◽  
pp. 011104 ◽  
Author(s):  
Miguel Levy ◽  
A. Chakravarty ◽  
H.-C. Huang ◽  
R. M. Osgood

1987 ◽  
Vol 83 (1) ◽  
pp. 15-22 ◽  
Author(s):  
W. Tolksdorf ◽  
H. Dammann ◽  
E. Pross ◽  
B. Strocka ◽  
H.J. Tolle ◽  
...  

2006 ◽  
Vol 99 (8) ◽  
pp. 08M702 ◽  
Author(s):  
I. Nistor ◽  
C. Holthaus ◽  
I. D. Mayergoyz ◽  
C. Krafft

1988 ◽  
Vol 24 (6) ◽  
pp. 2563-2564 ◽  
Author(s):  
B. Ferrand ◽  
B. Chambaz ◽  
J.C. Gay ◽  
M. Olivier ◽  
J.C. Lehureau

2013 ◽  
Vol 200 ◽  
pp. 245-249 ◽  
Author(s):  
Victor Vishnevskii ◽  
Vladimir N. Berzhansky ◽  
Vladislav Mikhailov ◽  
Fyodor Pankov ◽  
Alexandr Nedviga ◽  
...  

Magneto-optic eddy current introscopy device based on garnet films with stroboscopic illumination is described. Experiment was done with liquid-phase epitaxy garnet films with composition (Bi,Eu,Lu)3(Fe,Ga,Al)5O12 and (Bi,Tm)3(Fe,Ga)5O12, crystallographic orientation (111).


Author(s):  
N.A. Bert ◽  
A.O. Kosogov

The very thin (<100 Å) InGaAsP layers were grown not only by molecular beam epitaxy and metal-organic chemical vapor deposition but recently also by simple liquid phase epitaxy (LPE) technique. Characterization of their thickness, interfase abruptness and lattice defects is important and requires TEM methods to be used.The samples were InGaAsP/InGaP double heterostructures grown on (111)A GaAs substrate. The exact growth conditions are described in Ref.1. The salient points are that the quarternary layers were being grown at 750°C during a fast movement of substrate and a convection caused in the melt by that movement was eliminated. TEM cross-section specimens were prepared by means of conventional procedure. The studies were conducted in EM 420T and JEM 4000EX instruments.The (200) dark-field cross-sectional imaging is the most appropriate TEM technique to distinguish between individual layers in 111-v semiconductor heterostructures.


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