Gallium nitride based micro-cavity light emitting diodes emitting at 498 nm

2006 ◽  
Vol 203 (7) ◽  
pp. 1783-1786 ◽  
Author(s):  
P. Morgan Pattison ◽  
Rajat Sharma ◽  
Aurelian David ◽  
Ichitaro Waki ◽  
Claude Weisbuch ◽  
...  
2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Xing-ming Long ◽  
Rui-jin Liao ◽  
Jing Zhou

The electrical-thermal characteristics of gallium-nitride- (GaN-) based light-emitting diodes (LED), packaged by chips embedded in board (EIB) technology, were investigated using a multiphysics and multiscale finite element code, COMSOL. Three-dimensional (3D) finite element model for packaging structure has been developed and optimized with forward-voltage-based junction temperatures of a 9-chip EIB sample. The sensitivity analysis of the simulation model has been conducted to estimate the current and temperature distribution changes in EIB LED as the blue LED chip (substrate, indium tin oxide (ITO)), packaging structure (bonding wire and chip numbers), and system condition (injection current) changed. This method proved the reliability of simulated results in advance and useful material parameters. Furthermore, the method suggests that the parameter match on Shockley's equation parameters, Rs, nideal, and Is, is a potential method to reduce the current crowding effect for the EIB LED. Junction temperature decreases by approximately 3 K to 10 K can be achieved by substrate thinning, ITO, and wire bonding. The nonlinear-decreasing characteristics of total thermal resistance that decrease with an increase in chip numbers are likely to improve the thermal performance of EIB LED modules.


2014 ◽  
Vol 6 (19) ◽  
pp. 16601-16609 ◽  
Author(s):  
Su Jin Kim ◽  
Kyeong Heon Kim ◽  
Ho Young Chung ◽  
Hee Woong Shin ◽  
Byeong Ryong Lee ◽  
...  

2010 ◽  
Vol 87 (11) ◽  
pp. 2200-2207 ◽  
Author(s):  
Ali Z. Khokhar ◽  
Keith Parsons ◽  
Graham Hubbard ◽  
Faiz Rahman ◽  
Douglas S. Macintyre ◽  
...  

2013 ◽  
Vol 14 (10) ◽  
pp. 2444-2450 ◽  
Author(s):  
Jonghee Lee ◽  
Hyunsu Cho ◽  
Tae-Wook Koh ◽  
Simone Hofmann ◽  
Yong Hyun Kim ◽  
...  

1997 ◽  
Vol 482 ◽  
Author(s):  
G M Laws ◽  
J Morgan ◽  
G B Ren ◽  
I Harrison ◽  
E C Larkins ◽  
...  

AbstractWe report on the fabrication and characterisation gallium nitride light emitting diodes (LEDs) grown by molecular beam epitaxy on (0001) oriented sapphire and (111)B GaAs substrates. The current voltage characteristics of the devices grown on sapphire show turn on voltages of between 4 and 5V with large on-series resistance of 600Ω; for corresponding devices grown on GaAs these parameters are between 6 and 7V and 150 Ω, respectively.Room temperature electroluminescence (EL) spectra from the GaN LEDs ,grown on sapphire substrates, show a dominant emission at 3.2 eV (397nm) with a full width half maximum (FWHM) of 335 meV which is attributed to free electron to acceptor transitions (e, A−Mg). A broad low intensity deep level emission is also observed centred at 2.4 eV (506nm). The peak of the EL from the devices grown on GaAs is at 3.1eV rather than 3.2eV. The differences between the two sets of devices are probably caused by the different device geometry.Preliminary results show that an “annealing” effect caused by electrical stressing resulted in an improvement of the EL spectra. The stressed samples show an increase in the near band edge emission intensity, a 20meV reduction in the FWHM and a significant reduction in the intensity of the deep level emission. The devices have a large 1/f noise contribution which does not appear to change after electrical stressing.


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