Real‐time X‐ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments

2011 ◽  
Vol 208 (11) ◽  
pp. 2499-2504 ◽  
Author(s):  
A. N. Danilewsky ◽  
J. Wittge ◽  
A. Hess ◽  
A. Cröll ◽  
A. Rack ◽  
...  
Keyword(s):  
High Temperature ◽  
Real Time ◽  
X Ray Diffraction ◽  
Semiconductor Wafer ◽  
X Ray ◽  
In Situ Experiments ◽  
Diffraction Imaging

scholarly journals In-Situ X-ray Diffraction Measurement for Pure Niobium Metal in High Temperature Hydrogen Atmosphere

2006 ◽  
Vol 70 (6) ◽  
pp. 467-472 ◽  
Author(s):  
Tomonori Nambu ◽  
Nobue Shimizu ◽  
Hisakazu Ezaki ◽  
Hiroshi Yukawa ◽  
Masahiko Morinaga ◽  
...  
Keyword(s):  
High Temperature ◽  
Hydrogen Atmosphere ◽  
Diffraction Measurement ◽  
X Ray Diffraction ◽  
X Ray ◽  
Pure Niobium

The application of the in situ high-temperature X-ray diffraction quantitative analysis

2008 ◽  
Vol 452 (2) ◽  
pp. 446-450 ◽  
Author(s):  
Qiuguo Xiao ◽  
Ling Huang ◽  
Hui Ma ◽  
Xinhua Zhao
Keyword(s):  
High Temperature ◽  
Quantitative Analysis ◽  
X Ray Diffraction ◽  
X Ray

In situ high-temperature X-ray diffraction study of phase transformations in silver behenate

2005 ◽  
Vol 20 (02) ◽  
pp. 94-96 ◽  
Author(s):  
Thomas N. Blanton ◽  
Swavek Zdzieszynski ◽  
Michael Nicholas ◽  
Scott Misture
Keyword(s):  
High Temperature ◽  
Phase Transformations ◽  
Diffraction Study ◽  
X Ray Diffraction ◽  
X Ray
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