Enhancement‐Mode AlGaN/GaN Vertical Trench Metal–Insulator–Semiconductor High‐Electron‐Mobility Transistors with a High Drain Current Fabricated Using the AlGaN Regrowth Technique

2019 ◽  
Vol 217 (7) ◽  
pp. 1900622
Author(s):  
Akio Yamamoto ◽  
Keito Kanatani ◽  
Norifumi Yoneda ◽  
Joel T. Asubar ◽  
Hirokuni Tokuda ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document