Comparison of ECR plasma pretreatment techniques for ZnO atomic layer epitaxy on the sapphire substrate

2004 ◽  
Vol 1 (10) ◽  
pp. 2545-2549 ◽  
Author(s):  
Kyoungchul Shin ◽  
Chongmu Lee
2010 ◽  
Author(s):  
Masaki Murata ◽  
Yuji Tanaka ◽  
Hiroshi Kumagai ◽  
Tsutomu Shinagawa ◽  
Ataru Kobayashi

CrystEngComm ◽  
2020 ◽  
Vol 22 (19) ◽  
pp. 3309-3321 ◽  
Author(s):  
Mohd Nazri Abd Rahman ◽  
Yusnizam Yusuf ◽  
Afiq Anuar ◽  
Mohamad Raqif Mahat ◽  
Narong Chanlek ◽  
...  

An atomically flat covering with a dense and crack-free surface of aluminium nitride films was successfully deposited on a sapphire-(0 0 0 1) substrate through a pulsed atomic-layer epitaxy technique via horizontal metalorganic chemical vapour deposition.


2020 ◽  
Vol 59 (SG) ◽  
pp. SGGF10
Author(s):  
Masahiro Kawano ◽  
Ryo Minematsu ◽  
Tomohiro Haraguchi ◽  
Atsuhiko Fukuyama ◽  
Hidetoshi Suzuki

1996 ◽  
Vol 80 (4) ◽  
pp. 2363-2366 ◽  
Author(s):  
Hiroyuki Fujiwara ◽  
Toshiyuki Nabeta ◽  
Isamu Shimizu ◽  
Takashi Yasuda

1989 ◽  
Vol 55 (3) ◽  
pp. 244-246 ◽  
Author(s):  
Weon G. Jeong ◽  
E. P. Menu ◽  
P. D. Dapkus

1994 ◽  
Vol 33 (Part 2, No. 9B) ◽  
pp. L1292-L1294 ◽  
Author(s):  
Haruki Yokoyama ◽  
Masafumi Tanimoto ◽  
Masanori Shinohara ◽  
Naohisa Inoue

1996 ◽  
Vol 6 (1) ◽  
pp. 27-31 ◽  
Author(s):  
Minna Nieminen ◽  
Lauri Niinistö ◽  
Eero Rauhala

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