Surface oxidation kinetics of SiC powders in wet and dry air studied by x-ray photoelectron spectroscopy and bremsstrahlung-excited Auger electron spectroscopy

Surface and Interface Analysis ◽

10.1002/sia.1598 ◽

2003 ◽

Vol 35 (10) ◽

pp. 773-778 ◽

Author(s):

Thomas N. Wittberg ◽

Pu Sen Wang ◽

Stephen M. Hsu

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Oxidation Kinetics ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Oxidation ◽

X Ray ◽

Dry Air ◽

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Initial adsorption kinetics of oxygen on a Cu0.82Li0.18 alloy surface studied by combined Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and time‐of‐flight spectrometry of direct recoils

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574817 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1136-1141 ◽

Author(s):

M. H. Mintz ◽

U. Atzmony ◽

J. A. Schultz ◽

N. Shamir

Keyword(s):

Auger Electron Spectroscopy ◽

Adsorption Kinetics ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Time Of Flight ◽

Alloy Surface ◽

X Ray ◽

Initial Adsorption ◽

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Surface oxidation of silicon carbide platelets as studied by x-ray photoelectron spectroscopy and bremsstrahlung-excited Auger electron spectroscopy

Surface and Interface Analysis ◽

10.1002/sia.740180217 ◽

1992 ◽

Vol 18 (2) ◽

pp. 159-162 ◽

Author(s):

Pu Sen Wang ◽

Subhas G. Malghan ◽

Stephen M. Hsu ◽

T. N. Wittberg

Keyword(s):

Silicon Carbide ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Oxidation ◽

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results

10.3403/30242215 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Study of amorphous and crystallised Fe75B25 by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science ◽

10.1016/0169-4332(91)90396-2 ◽

1991 ◽

Vol 51 (3-4) ◽

pp. 139-155 ◽

Author(s):

S.K. Sharma ◽

S. Hofmann

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

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International Standardization of Quantitative Surface Analysis by Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

Shinku ◽

10.3131/jvsj.48.261 ◽

2005 ◽

Vol 48 (4) ◽

pp. 261-264

Author(s):

Shigeo TANUMA

Keyword(s):

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Quantitative Surface Analysis ◽

International Standardization

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Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results

Surface and Interface Analysis ◽

10.1002/sia.2533 ◽

2007 ◽

Vol 39 (5) ◽

pp. 464-466 ◽

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574092 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2463-2469 ◽

Author(s):

Brad J. Burrow ◽

Alan E. Morgan ◽

Russell C. Ellwanger

Keyword(s):

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

X Ray ◽

Sputter Deposited

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Growth of Surface Analysis and the Development of Databases and Modeling Software for Auger-Electron Spectroscopy and X-ray Photoelectron Spectroscopy

Microscopy Today ◽

10.1017/s1551929516000080 ◽

2016 ◽

Vol 24 (2) ◽

pp. 16-23 ◽

Author(s):

C. J. Powell

Keyword(s):

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Modeling Software

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Uniform Depth Profiling in X-ray Photoelectron Spectroscopy (Electron Spectroscopy for Chemical Analysis)

Applied Spectroscopy ◽

10.1366/000370278774331468 ◽

1978 ◽

Vol 32 (2) ◽

pp. 175-177 ◽

Author(s):

L. Bradley ◽

Y. M. Bosworth ◽

D. Briggs ◽

V. A. Gibson ◽

R. J. Oldman ◽

...

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

X Ray ◽

Nitride Oxide ◽

The difficulties of nonuniform ion etching which hamper depth profiling by X-ray photoelectron spectroscopy (XPS) have been overcome by use of a mechanically scanned saddle-field ion source. The system and its calibration for uniformity are described, and its performance is illustrated by the depth profile of a Si3N4/SiO2/Si metal nitride oxide silicon device. This also allows the potential advantages of XPS profiling over Auger electron spectroscopy profiling to be discussed.

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