Noble gas depth profiles in amorphous TiO2 films after sputtering

1988 ◽  
Vol 12 (2) ◽  
pp. 93-98 ◽  
Author(s):  
M. Wolff ◽  
J. W. Schultze
Keyword(s):  
Noble Gas ◽  
Tio2 Films ◽  
Depth Profiles ◽  
Amorphous Tio2

Retention of Surface Structure Causes Lower Density in Atomic Layer Deposition of Amorphous Titanium Oxide Thin Films

2021 ◽  
Author(s):  
Benjamin Rich ◽  
Yael Etinger-Geller ◽  
G. Ciatto ◽  
A Katsman ◽  
Boaz Pokroy
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Structure ◽  
Titanium Oxide ◽  
Size Effects ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Structural Modifications ◽  
Layer Deposition ◽  
Amorphous Tio2

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...

Photodegradation of Rhodamine 6G by Amorphous TiO2 Films Grown on Polymethylmethacrylate by Magnetron Sputtering

2017 ◽  
Vol 53 (6) ◽  
pp. 1022-1027 ◽  
Author(s):  
Julius Andrew P. Nuñez ◽  
Hernando S. Salapare ◽  
Michelle Marie S. Villamayor ◽  
Luis De Los Santos Valladares ◽  
Henry J. Ramos
Keyword(s):  
Magnetron Sputtering ◽  
Rhodamine 6G ◽  
Tio2 Films ◽  
Amorphous Tio2

Laser Selective Photoactivation of Amorphous TiO2 Films to Anatase and/or Rutile Crystalline Phases

2018 ◽  
Vol 1 (8) ◽  
pp. 3607-3613 ◽  
Author(s):  
Jaime A. Benavides ◽  
Charles P. Trudeau ◽  
Luis F. Gerlein ◽  
Sylvain G. Cloutier
Keyword(s):  
Tio2 Films ◽  
Crystalline Phases ◽  
Amorphous Tio2

scholarly journals The Meyer–Neldel rule in amorphous TiO2 films with different Fe content

2012 ◽  
Vol 27 (17) ◽  
pp. 2271-2277 ◽  
Author(s):  
Diana Mardare ◽  
Abdullah Yildiz ◽  
Radu Apetrei ◽  
Petronela Rambu ◽  
Daniel Florea ◽  
...  
Keyword(s):  
Tio2 Films ◽  
Fe Content ◽  
Amorphous Tio2 ◽  
Image Position

Abstract

Open air plasma chemical vapor deposition of highly dielectric amorphous TiO2 films

1996 ◽  
Vol 68 (21) ◽  
pp. 2965-2967 ◽  
Author(s):  
Hyun‐Kwon Ha ◽  
Mamoru Yoshimoto ◽  
Hideomi Koinuma ◽  
Bum‐Ki Moon ◽  
Hiroshi Ishiwara
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tio2 Films ◽  
Air Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Amorphous Tio2

GaAs Microisland Anodes Protected by Amorphous TiO2 Films Mitigate Corrosion Spreading During Water Oxidation in Alkaline Electrolytes

2021 ◽  
pp. 3709-3714
Author(s):  
Pakpoom Buabthong ◽  
Jake M. Evans ◽  
Katherine Z. Rinaldi ◽  
Kathleen M. Kennedy ◽  
Harold J. Fu ◽  
...  
Keyword(s):  
Water Oxidation ◽  
Tio2 Films ◽  
Alkaline Electrolytes ◽  
Amorphous Tio2
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