Photodegradation of Rhodamine 6G by Amorphous TiO2 Films Grown on Polymethylmethacrylate by Magnetron Sputtering

2017 ◽  
Vol 53 (6) ◽  
pp. 1022-1027 ◽  
Author(s):  
Julius Andrew P. Nuñez ◽  
Hernando S. Salapare ◽  
Michelle Marie S. Villamayor ◽  
Luis De Los Santos Valladares ◽  
Henry J. Ramos
Keyword(s):  
Magnetron Sputtering ◽  
Rhodamine 6G ◽  
Tio2 Films ◽  
Amorphous Tio2

Structure and corrosion properties of thin TiO2 films obtained by magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 164 ◽  
pp. 224-232 ◽  
Author(s):  
A. Kozlovskiy ◽  
I. Shlimas ◽  
K. Dukenbayev ◽  
M. Zdorovets
Keyword(s):  
Magnetron Sputtering ◽  
Tio2 Films ◽  
Corrosion Properties

Retention of Surface Structure Causes Lower Density in Atomic Layer Deposition of Amorphous Titanium Oxide Thin Films

2021 ◽  
Author(s):  
Benjamin Rich ◽  
Yael Etinger-Geller ◽  
G. Ciatto ◽  
A Katsman ◽  
Boaz Pokroy
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Structure ◽  
Titanium Oxide ◽  
Size Effects ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Structural Modifications ◽  
Layer Deposition ◽  
Amorphous Tio2

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...

Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature

1996 ◽  
Vol 281-282 ◽  
pp. 427-430 ◽  
Author(s):  
Kunio Okimura ◽  
Naohiro Maeda ◽  
Akira Shibata
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Tio2 Films ◽  
Rutile Tio2

scholarly journals INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

2001 ◽  
Vol 50 (7) ◽  
pp. 1390
Author(s):  
ZHAO KUN ◽  
ZHU FENG ◽  
WANG LI-FANG ◽  
MENG TIE-JUN ◽  
ZHANG BAO-CHENG ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron

Deposition of rutile TiO2 films by pulsed and high power pulsed magnetron sputtering

2016 ◽  
Vol 293 ◽  
pp. 16-20 ◽  
Author(s):  
W. Schönberger ◽  
H. Bartzsch ◽  
S. Schippel ◽  
T. Bachmann
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Tio2 Films ◽  
Rutile Tio2 ◽  
Pulsed Magnetron

Study on the Porosity of TiO2 Films Prepared by Using Magnetron Sputtering Deposition

2011 ◽  
Vol 58 (4(1)) ◽  
pp. 883-885 ◽  
Author(s):  
Ding Ren ◽  
Yu Zou ◽  
ChangYong Zhan ◽  
NingKang Huang
Keyword(s):  
Magnetron Sputtering ◽  
Tio2 Films ◽  
Sputtering Deposition
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