Ultrafast Oscillations in the Optical Emission from a Semiconductor Microcavity

Author(s):  
M. Koch ◽  
J. Shah ◽  
M. Tsuchiya ◽  
H. Wang ◽  
T. C. Damen ◽  
...  
2008 ◽  
Vol 78 (15) ◽  
Author(s):  
S. Ates ◽  
C. Gies ◽  
S. M. Ulrich ◽  
J. Wiersig ◽  
S. Reitzenstein ◽  
...  

2006 ◽  
Vol 133 ◽  
pp. 499-502 ◽  
Author(s):  
M. Manclossi ◽  
J. J. Santos ◽  
J. Faure ◽  
A. Guenmie-Tafo ◽  
D. Batani ◽  
...  

2008 ◽  
Author(s):  
Leonard Brillson ◽  
Daniel Doutt ◽  
Yufeng Dong ◽  
Michelle Myers ◽  
Dina Tayim ◽  
...  

2021 ◽  
Vol 33 (1) ◽  
pp. 012010
Author(s):  
Christopher B. Stutzman ◽  
Wesley F. Mitchell ◽  
Abdalla R. Nassar

Author(s):  
М. М. Ердевді ◽  
В. В. Звенигородський ◽  
П. П. Маркуш ◽  
О. Б. Шпеник

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 339-342 ◽  
Author(s):  
Yasuki AIHARA ◽  
Yuko HIROHATA ◽  
Tomoaki HINO ◽  
Toshiro YAMASHINA

Author(s):  
Franco Stellari ◽  
Peilin Song ◽  
James C. Tsang ◽  
Moyra K. McManus ◽  
Mark B. Ketchen

Abstract Hot-carrier luminescence emission is used to diagnose the cause of excess quiescence current, IDDQ, in a low power circuit implemented in CMOS 7SF technology. We found by optical inspection of the chip that the high IDDQ is related to the low threshold, Vt, device process and in particular to transistors with minimum channel length (0.18 μm). In this paper we will also show that it is possible to gain knowledge regarding the operating conditions of the IC from the analysis of optical emission due to leakage current, aside from simply locating defects and failures. In particular, we will show how it is possible to calculate the voltage drop across the circuit power grid from time-integrated acquisitions of leakage luminescence.


Author(s):  
C. Monachon ◽  
M.S. Zielinski ◽  
D. Gachet ◽  
S. Sonderegger ◽  
S. Muckenhirn ◽  
...  

Abstract Quantitative cathodoluminescence (CL) microscopy is a new optical spectroscopy technique that measures electron beam-induced optical emission over large field of view with a spatial resolution close to that of a scanning electron microscope (SEM). Correlation of surface morphology (SE contrast) with spectrally resolved and highly material composition sensitive CL emission opens a new pathway in non-destructive failure and defect analysis at the nanometer scale. Here we present application of a modern CL microscope in defect and homogeneity metrology, as well as failure analysis in semiconducting electronic materials


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