An efficient design of 45-nm CMOS low-noise charge sensitive amplifier for wireless receivers

<p>Amplifiers are widely used in signal receiving circuits, such as antennas, medical imaging, wireless devices and many other applications. However, one of the most challenging problems when building an amplifier circuit is the noise, since it affects the quality of the intended received signal in most wireless applications. Therefore, a preamplifier is usually placed close to the main sensor to reduce the effects of interferences and to amplify the received signal without degrading the signal-to-noise ratio. Although different designs have been optimized and tested in the literature, all of them are using larger than 100 nm technologies which have led to a modest performance in terms of equivalent noise charge (ENC), gain, power consumption, and response time. In contrast, we consider in this paper a new amplifier design technology trend and move towards sub 100 nm to enhance its performance. In this work, we use a pre-well-known design of a preamplifier circuit and rebuild it using 45 nm CMOS technology, which is made for the first time in such circuits. Performance evaluation shows that our proposed scaling technology, compared with other scaling technology, extremely reduces ENC of the circuit by more than 95%. The noise spectral density and time resolution are also reduced by 25% and 95% respectively. In addition, power consumption is decreased due to the reduced channel length by 90%. As a result, all of those enhancements make our proposed circuit more suitable for medical and wireless devices.</p>

Coherent phase transfer for real-world twin-field quantum key distribution

Quantum mechanics allows distribution of intrinsically secure encryption keys by optical means. Twin-field quantum key distribution is one of the most promising techniques for its implementation on long-distance fiber networks, but requires stabilizing the optical length of the communication channels between parties. In proof-of-principle experiments based on spooled fibers, this was achieved by interleaving the quantum communication with periodical stabilization frames. In this approach, longer duty cycles for the key streaming come at the cost of a looser control of channel length, and a successful key-transfer using this technique in real world remains a significant challenge. Using interferometry techniques derived from frequency metrology, we develop a solution for the simultaneous key streaming and channel length control, and demonstrate it on a 206 km field-deployed fiber with 65 dB loss. Our technique reduces the quantum-bit-error-rate contributed by channel length variations to <1%, representing an effective solution for real-world quantum communications.

Investigation of random telegraph noise characteristics of Hf-based MONOS nonvolatile memory devices with HfO2 and HfON tunneling layer

This paper investigated the low frequency noise (LFN) utilizing 1/f noise and random telegraph noise (RTN) characteristics of Hf-based metal/oxide/nitride/oxide/silicon (MONOS) nonvolatile memory (NVM) device with HfO2 and HfON tunneling layer (TL). The low frequency noise spectral density (SID ) was investigated to evaluate the interface characteristics with fresh and after programming/erasing (P/E) cycles of 104. Both devices show similar slope of ~1/f in all of the frequency regions. Although HfON TL shows high SID compared to HfO2 TL, increased ratio is 15.4 which is low compared to HfO2 TL of 21.3. As decreasing the channel length from 10 to 2 μm, HfON TL shows small increased ratio of SID . Due to the nitrided characteristics, HfON TL suppress the degradation of interface. Finally, it is found that trap site of HfO2 TL is located near the interface by RTN measurement with capture (τC) and emission time constant (τE).

Process Corresponding Implications Associated with a Conclusive Model-Fit Current-Voltage Characteristic Curves

NFinFET transistors with various fin widths (110 nm, 115 nm, and 120 nm) are put into measurements, and the data are collected. By using the modified model, the measure data is fitted. Several parameters in the formula of modified model are determined to make both the measured data and the fitting data almost as close as possible. Those parameters are listed and analyzed, including kN (proportional to channel width and gate oxide capacitor, and inversely proportional to the channel length) λ (the inverse of Early Voltage), and sometimes Vth (Threshold Voltage). By kN, the appropriate process control can be high lighted, the corresponding channel concentration can be calculated and thus many implicit physical quantities may be exploited.

Analysis of InN/La2O3 Twosome for Double-Gate MOSFETs for Radio Frequency Applications

The channel material of a gate describes the operating condition of the MOSFET. A suitable operating condition prevails in MOSFETs if the transistors are quite enough to observe and control at the nanometer regime. An efficient gate and channel material have been proposed in this work which is based on the electrical properties they exhibit at the temperature of 300K. The doping concentration for the electrons and holes is maintained to be 1Χ1019cm-3 for the entire electronic simulator. The simulation results show that using La2O3 along with Indium Nitride (InN) material for the designing of Double-Gate (DG) MOSFETs provides better controllability over the transistor at a channel length of 50nm. This proposed DG-MOSFET is more compliant than the conventional coplanar MOSFETs based on Silicon.

Numerical Modelling of Carrier Transport in Organic Field Effect Transistors

Organic field effect transistors (OFETs), used in the fabrication of nano-sensors, are one of the most promising devices in the field of organic electronics, because of their light weight, flexible and low fabrication cost. However, the optimization of such OFETs is still in an early stage due to the very limited analytical as well as numerical models presented in the literature. This research presses to demonstrate a numerical carrier transport model based on finite element method (FEM), to investigate the I-V characteristic of OFETs. Two various organic semiconductor materials have been included in the study, polyaniline and pentacene, where a micro-scale as well as a nano-scale models have been presented. OFETs have been studied in terms of channel length, dielectric thickness, and doping level impact. We nominated the threshold voltage, the on/off current ratio, the sub threshold swing, and the field effect mobility’s as the main output evaluating parameters. The numerical model has shown the criticality of the doping effect on tuning the device flowing drain current, to exceed 300 μA saturation current, along with threshold voltage of -0.1 V under a channel length of 30 nm. Additionally, the study highlights the effectiveness of the polyaniline over pentacene as nano-channel length OFET, due to the boosted conductivity of polyaniline with respect to pentacene.

Ultrahigh ON/Off Current Ratio γ-Graphyne-1 Nanotube Based Sub 10 nm TFET Modeling and Simulation

Utilizing γ-graphyne-1 nanotubes (GyNTs) in the Tunneling Field Effect Transistors (TFETs) suppresses ambipolarity and enhances subthreshold swing (SS) of TFETs which is because of large energy band gap and high electron effective mass of GyNTs. In this research analysis of structural, electronic and thermoelectric properties of γ-graphyne-1 family under the deformation potential (DP) approach reveals that electron-phonon mean free path (MFP) of an Armchair GyNT (3AGyNT) and Zigzag GyNT (2ZGyNT) are 45 and 290 nm, respectively. Therefore, ballistic transport of sub 10 nm 3AGyNT-TFETs and 2ZGyNT-TFETs in different channel lengths are investigated utilizing Non-Equilibrium Green’s Function (NEGF) formalism in the DFTB platform. Ultrahigh Current Ratio (OOCR) value of 1.6 x 1010 at VDD = 0.2 V and very low point SS of 5 mV/dec are belonged to the 3AGyNT-TFET with channel length of 9.6 nm. 2ZGyNT-TFETs shows higher on-state current and SS as well as lower OOCR than those of 3AGyNT-TFETs. A linear relationship between channel length and logarithmic off-state current is reported that is consistent with WKB approximation. The obtained results along with the ultralow power consumption of the suggested GyNT-TFETs, make them as replacement of digital silicon MOSFETs in the next generation nanoelectronic devices.

Characterization of silicon tunnel field effect transistor based on charge plasma

The aim of the proposed paper is an analytical model and realization of the characteristics for tunnel field-effect transistor (TFET) based on charge plasma (CP). One of the most applications of the TFET device which operates based on CP technique is the biosensor. CP-TFET is to be used as an effective device to detect the uncharged molecules of the bio-sample solution. Charge plasma is one of some techniques that recently invited to induce charge carriers inside the devices. In this proposed paper we use a high work function in the source (ϕ=5.93 eV) to induce hole charges and we use a lower work function in drain (ϕ=3.90 eV) to induce electron charges. Many electrical characterizations in this paper are considered to study the performance of this device like a current drain (ID) versus voltage gate (Vgs), ION/IOFF ratio, threshold voltage (VT) transconductance (gm), and sub-threshold swing (SS). The signification of this paper comes into view enhancement the performance of the device. Results show that high dielectric (K=12), oxide thickness (Tox=1 nm), channel length (Lch=42 nm), and higher work function for the gate (ϕ=4.5 eV) tend to best charge plasma silicon tunnel field-effect transistor characterization.