Influence of temperature profile on product yields in pyrolysis of hydrocarbon feedstock

1978 ◽  
Vol 14 (7) ◽  
pp. 479-482
Author(s):  
S. M. Furer ◽  
T. N. Mukhina ◽  
M. N. Kovalenko ◽  
I. N. Garin ◽  
T. P. Chumachenko
2020 ◽  
Vol 61 (4) ◽  
pp. 593-600
Author(s):  
M. B. Shavelkina ◽  
P. P. Ivanov ◽  
R. Kh. Amirov ◽  
A. N. Bocharov

1998 ◽  
Vol 512 ◽  
Author(s):  
V. P. Madangarli ◽  
T. S. Sudarshan ◽  
C. C. Tin

ABSTRACTUsing a fast ramp response technique, the high field characteristics, specifically the breakdown strength, of thermally grown silicon-dioxide (SiO2) and MOCVD grown aluminum-nitride (AIN), on n-type 6H-SiC epilayers is obtained as a function of three different processing conditions for the insulator growth. Significant improvement in the breakdown strength of thermally grown SiO2 after a 30 minute post annealing at 400°C in nitrogen ambient is reported. Further, the influence of temperature profile during the AIN growth on the breakdown strength is reported.


2011 ◽  
Vol 393-395 ◽  
pp. 184-188 ◽  
Author(s):  
Michael T. Heitzmann ◽  
Meng Hou ◽  
Martin Veidt ◽  
Luigi Jules Vandi ◽  
Rowan Paton

The morphology of the interface between a commercial epoxy prepreg resin (HexPly M18/1) and Polyetherimide (PEI) is studied. Different cure cycles prescribed by the supplier were investigated to determine the influence of temperature and pressure on interface formation. Atomic Force Microscopy (AFM) was used as the main means of investigation. A phase-separated interphase spanning 9-10μm was observed for the PEI/epoxy prepreg interface. It was found that the temperature profile of the cure cycle strongly influences the formation of this interphase. Rapid formation of these relatively large interphase areas suggests that mechanisms other than diffusion are responsible for this phenomenon.


Cryobiology ◽  
2008 ◽  
Vol 57 (3) ◽  
pp. 330
Author(s):  
Nicola Hofmann ◽  
Huan Sun ◽  
Inga Bernemann ◽  
Birgit Glasmacher

Fuel ◽  
2018 ◽  
Vol 216 ◽  
pp. 463-474 ◽  
Author(s):  
Beatriz Valle ◽  
Borja Aramburu ◽  
Martin Olazar ◽  
Javier Bilbao ◽  
Ana G. Gayubo

Author(s):  
T. Geipel ◽  
W. Mader ◽  
P. Pirouz

Temperature affects both elastic and inelastic scattering of electrons in a crystal. The Debye-Waller factor, B, describes the influence of temperature on the elastic scattering of electrons, whereas the imaginary part of the (complex) atomic form factor, fc = fr + ifi, describes the influence of temperature on the inelastic scattering of electrons (i.e. absorption). In HRTEM simulations, two possible ways to include absorption are: (i) an approximate method in which absorption is described by a phenomenological constant, μ, i.e. fi; - μfr, with the real part of the atomic form factor, fr, obtained from Hartree-Fock calculations, (ii) a more accurate method in which the absorptive components, fi of the atomic form factor are explicitly calculated. In this contribution, the inclusion of both the Debye-Waller factor and absorption on HRTEM images of a (Oll)-oriented GaAs crystal are presented (using the EMS software.Fig. 1 shows the the amplitudes and phases of the dominant 111 beams as a function of the specimen thickness, t, for the cases when μ = 0 (i.e. no absorption, solid line) and μ = 0.1 (with absorption, dashed line).


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