scholarly journals Control of Lateral Composition Distribution in Graded Films of Soluble Solid Systems A1−xBx by Partitioned Dual-Beam Pulsed Laser Deposition

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 540
Author(s):  
Joe Sakai ◽  
José Manuel Caicedo Roque ◽  
Pablo Vales-Castro ◽  
Jessica Padilla-Pantoja ◽  
Guillaume Sauthier ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Ambient Pressure ◽  
Thickness Distribution ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Composition Gradient ◽  
Composition Distribution ◽  
Dual Beam ◽  
Soluble Solid ◽  
Characteristic Features

Lateral compositionally-graded thin films are powerful media for the observation of phase boundaries as well as for high-throughput materials exploration. We herein propose a method to prepare epitaxial lateral compositionally-graded films using a dual-beam pulsed laser deposition (PLD) method with two targets separated by a partition. Tuning the ambient pressure and the partition—substrate gap makes it possible to control of the gradient length of the deposits at the small sizes (≤ 10 mm) suitable for commercial oxide single crystal substrates. A simple Monte Carlo simulation qualitatively reproduced the characteristic features of the lateral thickness distribution. To demonstrate this method, we prepared (1−x)PbTiO3—xPbZrO3 and (1−x)LaMnO3—xLa0.6Sr0.4MnO3 films with lateral composition gradient widths of 10 and 1 mm, respectively, with the partitioned dual PLD.

Microstructure of Compositionally Graded PZT films Grown by Pulsed Laser Deposition

2008 ◽  
Vol 14 (S3) ◽  
pp. 53-56
Author(s):  
S.A.S. Rodrigues ◽  
A. Khodorov ◽  
M. Pereira ◽  
M.J.M. Gomes
Keyword(s):  
Pulsed Laser Deposition ◽  
Lead Zirconate Titanate ◽  
Film Growth ◽  
Pulsed Laser ◽  
Hysteresis Loops ◽  
Lead Zirconate ◽  
Laser Deposition ◽  
Composition Gradient ◽  
Complex Structures ◽  
Pzt Films

Ferroelectric films with a composition gradient have attracted much attention because of their large polarization offset present in the hysteresis loops. Lead Zirconate Titanate (PZT) films were deposited on Pt/TiO2/SiO2/Si substrates by Pulsed Laser Deposition (PLD) technique, using a Nd:YAG laser (Surelite) with a source pulse wavelength of 1064 nm and duration of 5-7 ns delivering an energy of 320 mJ per pulse and a laser fluence energy about 20 J/cm2. The film growth is performed in O2 atmosphere (0,40 mbar) while the substrate is heated at 600°C by a quartz lamp. Starting from ceramic targets based on PZT compositions and containing 5% mol. of excess of PbO to compensate the lead evaporation during heat treatment, three films with different compositions Zr/Ti 55/45, 65/35 and 92/8, and two types of complex structures were produced. These complex structures are in the case of the up-graded structure (UpG), with PZT (92/8) at the bottom, PZT (65/35) on middle and PZT (55/45) on the top, and for down-graded (DoG) one, that order is reversed.

Effect of Annealing on Structural and Optical Properties of Pulsed Laser Deposited Titanium Dioxide Thin Films

2009 ◽  
Vol 67 ◽  
pp. 65-70 ◽  
Author(s):  
Gaurav Shukla ◽  
Alika K. Khare
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Annealing Temperature ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tio2 Thin Films ◽  
Post Annealing ◽  
Post Annealing Temperature

TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors, cancer therapy and high effect solar cell. However, investigations demonstrated that the properties and applications of titanium oxide films depend upon the nature of the crystalline phases present in the films, i.e. anatase and rutile phases. We report on the pulsed laser deposition of high quality TiO2 thin films. Pulsed Laser deposition of TiO2 thin films were performed in different ambient viz. oxygen, argon and vacuum, using a second harmonic of Nd:YAG laser of 6 ns pulse width. These deposited films of TiO2 were further annealed for 5hrs in air at different temperatures. TiO2 thin films were characterized using x-ray diffraction, SEM, photoluminescence, transmittance and reflectance. We observed effect of annealing over structural, morphological and optical properties of TiO2 thin films. The anatase phase of as-deposited TiO2 thin films is found to change into rutile phase with increased annealing temperature. Increase in crystalline behaviour of thin films with post-annealing temperature is also observed. Surface morphology of TiO2 thin films is dependent upon ambient pressure and post- annealing temperature. TiO2 thin films are found to be optically transparent with very low reflectivity hence will be suitable for antireflection coating applications.

Epitaxial composition-graded perovskite films grown by a dual-beam pulsed laser deposition method

2013 ◽  
Vol 380 ◽  
pp. 106-110 ◽  
Author(s):  
Joe Sakai ◽  
Cécile Autret-Lambert ◽  
Thierry Sauvage ◽  
Blandine Courtois ◽  
Jérôme Wolfman ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Method ◽  
Dual Beam

Highly Conductive and Optically Transparent Polycrystalline Iridium Oxide Thin Films Grown by Reactive Pulsed Laser Deposition

1997 ◽  
Vol 472 ◽  
Author(s):  
M.A. El Khakani ◽  
M. Chaker
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Deposition Temperature ◽  
Room Temperature ◽  
Optical Transmission ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Structure Morphology ◽  
Quartz Substrates

ABSTRACTReactive pulsed laser deposition has been used to deposit IrO2 thin films on both SiO2 and fused quartz substrates, by ablating a metal iridium target in oxygen atmosphere. At a KrF laser intensity of about 1.7 × 109 W/cm2, IrO2 films were deposited at substrate deposition temperatures ranging from room-temperature to 700 °C under an optimum oxygen ambient pressure of 200 mTorr. The structure, morphology, electrical resistivity and optical transmission of the deposited films were characterized as a function of their deposition temperature (Td). High quality IrO2 films are obtained in the 400–600 °C deposition temperature range. They are polycrystalline with preferred orientations, depending on the substrate, and show a dense granular morphology. At a Td as low as 400 °C, highly conductive IrO2 films with room-temperature resistivities as low as (42±6) μΩ cm are obtained. Over the 300–600 °C Td range, the IrO2 films were found to exhibit a maximum optical transmission at 450 °C (∼ 45 % at 500 nm for 80 nm-thick films).

Effect of Ga Re-evaporation on AlxGa1-xN Thin Film Growth by Dual-Beam Pulsed Laser Deposition Method in N2Ambient

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2856-2857 ◽  
Author(s):  
Yoichiro Masuyama ◽  
Shinsuke Komatsu ◽  
Masaya Kiso ◽  
Kouhei Mizuno ◽  
Takeshi Kobayashi
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Deposition Method ◽  
Dual Beam

Variation of bandgap with oxygen ambient pressure in MgxZn1−xO thin films grown by pulsed laser deposition

2001 ◽  
Vol 117 (11) ◽  
pp. 673-677 ◽  
Author(s):  
P. Misra ◽  
P. Bhattacharya ◽  
K. Mallik ◽  
S. Rajagopalan ◽  
L.M. Kukreja ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition

Pulsed Laser Deposition of Barium Zirconate Thin Films for Neutral Imaging Applications

1996 ◽  
Vol 441 ◽  
Author(s):  
R. Leuchtner ◽  
R. Yanochko ◽  
J. Krzanowski ◽  
W. Brock ◽  
J. Quinn
Keyword(s):  
Pulsed Laser Deposition ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Single Layer ◽  
Laser Deposition ◽  
Degree Of Crystallinity ◽  
Great Promise ◽  
Barium Zirconate ◽  
Space Applications ◽  
Force Microscopy

AbstractLow work function surfaces offer great promise as thermionic converters and neutral conversion surfaces due to the relative ease with which electrons may be removed. BaZrO3 surfaces were prepared using pulsed laser deposition (PLD) and their materials properties evaluated for potential use as a neutral conversion surface for space applications. Single layer films were fabricated at temperatures ranging from 110°C to 600°C, and as a function of background ambient pressure. The degree of crystallinity of the resulting films was measured using x-ray diffraction (XRD) and the surface morphology evaluated with atomic force microscopy (AFM). The film quality was found to be directly related to substrate temperature: an increase in grain size from ˜ 10 nm to >50 nm and improved crystal orientation with respect to the substrate were observed as the deposition temperature was increased from 110°C to 600°C.

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