scholarly journals Towards Scalable Large-Area Pulsed Laser Deposition

Materials ◽  
2021 ◽  
Vol 14 (17) ◽  
pp. 4854
Author(s):  
Zakhar Vakulov ◽  
Daniil Khakhulin ◽  
Evgeny Zamburg ◽  
Alexander Mikhaylichenko ◽  
Vladimir A. Smirnov ◽  
...  
Keyword(s):  
Film Thickness ◽  
Pulsed Laser Deposition ◽  
Thickness Distribution ◽  
Large Diameter ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Uniform Thickness ◽  
Technological Parameters ◽  
Distribution Profile ◽  
Thickness Uniformity

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 mm) since the area of the laser spot (1–5 mm2) on the surface of the ablated target is incommensurably smaller than the substrate area. This paper reports the methodology that allows to calculate the distribution profile of the film thickness over the surface substrate with a large diameter, taking into account the construction and technological parameters of the pulsed laser deposition equipment. Experimental verification of the proposed methodology showed that the discrepancy with the experiment does not exceed 8%. The modeling of various technological parameters influence on the thickness uniformity has been carried out. Based on the modeling results, recommendations and parameters are proposed for manufacturing uniform thickness films. The results allow for increasing the film thickness uniformity with the thickness distribution < 5% accounts for ~ 31% of 300 mm diameter substrate.

Correlation between Film Thickness and Critical Current Density of Sm1+xBa2-xCu3O6+δ Films Deposited by Pulsed Laser Deposition

2002 ◽  
Vol 41 (Part 2, No. 9A/B) ◽  
pp. L983-L985 ◽  
Author(s):  
Kimihiko Sudoh ◽  
Yusuke Ichino ◽  
Masakazu Itoh ◽  
Yutaka Yoshida ◽  
Yoshiaki Takai ◽  
...  
Keyword(s):  
Critical Current Density ◽  
Film Thickness ◽  
Pulsed Laser Deposition ◽  
Critical Current ◽  
Current Density ◽  
Pulsed Laser ◽  
Laser Deposition

scholarly journals Control of Lateral Composition Distribution in Graded Films of Soluble Solid Systems A1−xBx by Partitioned Dual-Beam Pulsed Laser Deposition

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 540
Author(s):  
Joe Sakai ◽  
José Manuel Caicedo Roque ◽  
Pablo Vales-Castro ◽  
Jessica Padilla-Pantoja ◽  
Guillaume Sauthier ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Ambient Pressure ◽  
Thickness Distribution ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Composition Gradient ◽  
Composition Distribution ◽  
Dual Beam ◽  
Soluble Solid ◽  
Characteristic Features

Lateral compositionally-graded thin films are powerful media for the observation of phase boundaries as well as for high-throughput materials exploration. We herein propose a method to prepare epitaxial lateral compositionally-graded films using a dual-beam pulsed laser deposition (PLD) method with two targets separated by a partition. Tuning the ambient pressure and the partition—substrate gap makes it possible to control of the gradient length of the deposits at the small sizes (≤ 10 mm) suitable for commercial oxide single crystal substrates. A simple Monte Carlo simulation qualitatively reproduced the characteristic features of the lateral thickness distribution. To demonstrate this method, we prepared (1−x)PbTiO3—xPbZrO3 and (1−x)LaMnO3—xLa0.6Sr0.4MnO3 films with lateral composition gradient widths of 10 and 1 mm, respectively, with the partitioned dual PLD.

Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

2008 ◽  
Vol 93 (3) ◽  
pp. 617-620 ◽  
Author(s):  
Martin Pavlišta ◽  
Martin Hrdlička ◽  
Petr Němec ◽  
Jan Přikryl ◽  
Miloslav Frumar
Keyword(s):  
Pulsed Laser Deposition ◽  
Thickness Distribution ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

In-Situ Optical Diagnostics During Pulsed-Laser Deposition of Magnetoresistive La-Ca-Mn-O Films on Silicon Substrates

1996 ◽  
Vol 441 ◽  
Author(s):  
P.-J. Kung ◽  
J. E. Cosgrove ◽  
K. Kinsella ◽  
D. G. Hamblen
Keyword(s):  
Film Thickness ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Target Surface ◽  
Laser Deposition ◽  
Silicon Substrates ◽  
Ft Ir

AbstractDuring pulsed-laser deposition of La0.67Ca0.33MnO3 films on silicon substrates, a system that consists of visible optical-emission spectroscopy (OES) and Fourier transform infrared (FT-IR) spectroscopy is employed to perform in-situ diagnosis of the laser-induced plume and to monitor the substrate temperature and the film thickness. The effects of oxygen pressure, laser fluence, and distance from the target surface on emission spectra were studied. In FT-IR measurements, the slopes of the reflectance versus wavenumber curves were observed to increase with film thickness and hence with time, which provides end-point detection during the film growth. La0.67Ca0.33MnO3 films with (100), (110), and mixed orientations, depending on the substrate temperature, were deposited on yttria-stabilized zirconia (YSZ) buffered Si(100) and Si(111) substrates. In a magnetic field of 5 T, the maximum magnetoresistance (MR) values of 250% at 195 K and 164% at 140 K were observed in the as-deposited (110) and (100) films, respectively.

METHODS FOR PULSED LASER DEPOSITION OF LARGE-AREA FILMS USING MORE THAN ONE TARGET

2012 ◽  
Vol 15 ◽  
pp. 170-178
Author(s):  
A.A. KUZANYAN ◽  
V.A. PETROSYAN ◽  
A.S. KUZANYAN
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Functional Materials ◽  
Coated Conductors ◽  
Laser Deposition ◽  
Uniform Thickness ◽  
Large Area ◽  
Average Value ◽  
Modern Technologies

Several new methods of pulsed laser deposition for fabricating large-area thin films of uniform thickness and composition on a rotating substrate and onto a moving ribbon are proposed. The peculiarities of the methods are the laser deposition of a compound upon a substrate through a diaphragm or the mask placed in immediate proximity of the substrate together with a use of more than one target. The proposed method makes it possible to obtain thin films of uniform thickness on substrates with sizes limited only by the deposition chamber size. Some of the methods are experimentally verified by depositing CuO thin films and the deviation of the film thickness from the average value does not exceed ±3%. Given the advantage of laser deposition, the offered methods should find practical use, in particular, in micro-electronics, optical industry, development of superconducting coated conductors, deposition of thin films of functional materials and other modern technologies.

Probing the Dead Layer in Barium Strontium Titanate Capacitors Made by Pulsed Laser Deposition

2001 ◽  
Vol 688 ◽  
Author(s):  
L. J. Sinnamon ◽  
R. M. Bowman ◽  
J. M. Gregg
Keyword(s):  
Film Thickness ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dead Layer ◽  
Mismatch Strain ◽  
Barium Strontium ◽  
Thin Film Capacitors ◽  
Layer Effect ◽  
The Dead

AbstractThin film capacitors with structures Au/Ba0.5Sr0.5TiO3/SrRuO3 were fabricated by pulsed laser deposition onto {001}-oriented MgO single crystal substrates. As part of an overall programme to investigate the so-called ‘dead-layer’ effect, polarisation loops were taken from the capacitors and analysed as a function of BST film thickness. Analysis was done within a Landau-Ginzburg-Devonshire (LGD) framework, and showed that for film thickness greater than ∼100nm, changes in the dielectric behaviour of the BST were dominated more by epitaxial mismatch strain, than by the conventional notion of the dead-layer.

Sign in / Sign up

Export Citation Format

Share Document