Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
2016 ◽
Vol 51
(11)
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pp. 5082-5091
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2012 ◽
Vol 51
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pp. 121101
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2012 ◽
Vol 51
(12R)
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pp. 121101
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2020 ◽
Vol 13
(7)
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pp. 1997-2023
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2019 ◽
Vol 37
(6)
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pp. 060903
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Keyword(s):
2019 ◽
Vol 16
(12)
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pp. 1900127
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2017 ◽
Vol 35
(3)
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pp. 031510
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2007 ◽
Vol 111
(33)
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pp. 8147-8151
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