Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors

2017 ◽  
Vol 35 (3) ◽  
pp. 031510 ◽  
Author(s):  
Hanearl Jung ◽  
Il-Kwon Oh ◽  
Seungmin Yeo ◽  
Hyungjun Kim ◽  
Su Jeong Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Electrical Properties ◽  
Vapor Deposition ◽  
Thin Film Transistors ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Growth Characteristics ◽  
Oxide Thin Film ◽  
Pulsed Plasma ◽  
Layer Deposition

Pre-Patterned CVD Graphene: Insights on ALD deposition parameters and their influence on Al2O3 and graphene layers

MRS Advances ◽  
2016 ◽  
Vol 1 (20) ◽  
pp. 1401-1409 ◽  
Author(s):  
Gabriela B. Barin ◽  
Antonio G. Souza Filho ◽  
Ledjane S. Barreto ◽  
Jing Kong
Keyword(s):  
Electrical Properties ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Graphene Layers ◽  
Deposition Parameters ◽  
Layer Deposition ◽  
Cvd Growth ◽  
Selective Chemical ◽  
Number Of Cycles

ABSTRACTFabrication of graphene nanostructures it is important for both investigating their intrinsic physical properties and applying them into various functional devices. In this work we present a study on atomic layer deposition (ALD) of Al2O3 to produce patterned graphene through area-selective chemical vapor deposition (CVD) growth. A systematic parametric study was conducted to determine how the number of cycles and the purging time affect the morphology and the electrical properties of both graphene and Al2O3 layers.

scholarly journals TiO 2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

2019 ◽  
Vol 16 (12) ◽  
pp. 1900127 ◽  
Author(s):  
Morteza Aghaee ◽  
Joerie Verheyen ◽  
Alquin A. E. Stevens ◽  
Wilhelmus M. M. Kessels ◽  
Mariadriana Creatore
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Deposition
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