Multicolored-light emission from InGaN/GaN multiple quantum wells grown by selective-area epitaxy on patterned Si(100) substrates

2018 ◽  
Vol 53 (24) ◽  
pp. 16439-16446 ◽  
Author(s):  
Qi Wang ◽  
Guodong Yuan ◽  
Tongbo Wei ◽  
Zhiqiang Liu ◽  
Wenqiang Liu ◽  
...  
2008 ◽  
Vol 104 (10) ◽  
pp. 103530 ◽  
Author(s):  
W. Feng ◽  
V. V. Kuryatkov ◽  
A. Chandolu ◽  
D. Y. Song ◽  
M. Pandikunta ◽  
...  

2015 ◽  
Vol 83 ◽  
pp. 22-28 ◽  
Author(s):  
Zhenlong Wu ◽  
Peng Chen ◽  
Guofeng Yang ◽  
Zhou Xu ◽  
Feng Xu ◽  
...  

2002 ◽  
Vol 81 (16) ◽  
pp. 3102-3103 ◽  
Author(s):  
H. K. Cho ◽  
J. Y. Lee ◽  
N. Sharma ◽  
C. J. Humphreys ◽  
G. M. Yang ◽  
...  

2011 ◽  
Vol 679-680 ◽  
pp. 801-803
Author(s):  
Ji Sheng Han ◽  
Sima Dimitrjiev ◽  
Li Wang ◽  
Alan Iacopi ◽  
Qu Shuang ◽  
...  

Gallium nitrides are primarily used for their excellent light emission properties. GaN LEDs are mostly grown on foreign substrates, essentially sapphire and SiC, but more recently, also on Si substrates. In this paper, we will demonstrate that the high structural quality of InGaN/GaN multiple quantum wells can be deposited on 3C-SiC/Si (111) substrate using MOCVD. This demonstrates that 3C-SiC/Si is a promising template for the epitaxial growth of InGaN/GaN multiple quantum wells for LEDs.


2001 ◽  
Vol 79 (16) ◽  
pp. 2594-2596 ◽  
Author(s):  
H. K. Cho ◽  
J. Y. Lee ◽  
N. Sharma ◽  
C. J. Humphreys ◽  
G. M. Yang ◽  
...  

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