Morphology evolution and emission properties of InGaN/GaN multiple quantum wells grown on GaN microfacets using crossover stripe patterns by selective area epitaxy

2015 ◽  
Vol 331 ◽  
pp. 444-448 ◽  
Author(s):  
Zhenlong Wu ◽  
Peng Chen ◽  
Guofeng Yang ◽  
Zhou Xu ◽  
Feng Xu ◽  
...  
2008 ◽  
Vol 104 (10) ◽  
pp. 103530 ◽  
Author(s):  
W. Feng ◽  
V. V. Kuryatkov ◽  
A. Chandolu ◽  
D. Y. Song ◽  
M. Pandikunta ◽  
...  

2018 ◽  
Vol 53 (24) ◽  
pp. 16439-16446 ◽  
Author(s):  
Qi Wang ◽  
Guodong Yuan ◽  
Tongbo Wei ◽  
Zhiqiang Liu ◽  
Wenqiang Liu ◽  
...  

2013 ◽  
Vol 22 (7) ◽  
pp. 076803 ◽  
Author(s):  
Wen-Yu Cao ◽  
Yong-Fa He ◽  
Zhao Chen ◽  
Wei Yang ◽  
Wei-Min Du ◽  
...  

2006 ◽  
Vol 89 (15) ◽  
pp. 151906 ◽  
Author(s):  
Yen-Lin Lai ◽  
Chuan-Pu Liu ◽  
Yung-Hsiang Lin ◽  
Ray-Ming Lin ◽  
Dong-Yuan Lyu ◽  
...  

1997 ◽  
Vol 482 ◽  
Author(s):  
K. C. Zeng ◽  
M. Smith ◽  
J. Y. Lin ◽  
H. X. Jiang ◽  
H. Tang ◽  
...  

AbstractEffects of well thickness and Si-doping on the photoluminescence (PL) emission properties of GaN/AlxGa1-xN (x ∼ 0.07) and InxGa1-xN/GaN (x ∼ 0.15–0.2) multiple quantum wells (MQWs) grown both by MOCVD and reactive MBE have been studied. The room temperature emission mechanisms have also been addressed.


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