CrxSb2Te1 materials for phase change memory with high speed and good thermal stability performance

2015 ◽  
Vol 26 (6) ◽  
pp. 4138-4143 ◽  
Author(s):  
Qing Wang ◽  
Bo Liu ◽  
Yangyang Xia ◽  
Zhonghua Zhang ◽  
Xinglong Ji ◽  
...  
2016 ◽  
Vol 108 (22) ◽  
pp. 223103 ◽  
Author(s):  
Yifeng Hu ◽  
Xiaoqin Zhu ◽  
Hua Zou ◽  
Jianhao Zhang ◽  
Li Yuan ◽  
...  

2017 ◽  
Vol 696 ◽  
pp. 150-154 ◽  
Author(s):  
Yifeng Hu ◽  
Xiaoqin Zhu ◽  
Hua Zou ◽  
Long Zheng ◽  
Sannian Song ◽  
...  

2016 ◽  
Author(s):  
Li Yuan ◽  
Yifeng Hu ◽  
Xiaoqin Zhu ◽  
Jianhao Zhang ◽  
Hua Zou ◽  
...  

2018 ◽  
Vol 29 (50) ◽  
pp. 505710 ◽  
Author(s):  
Tianqi Guo ◽  
Sannian Song ◽  
Yonghui Zheng ◽  
Yuan Xue ◽  
Shuai Yan ◽  
...  

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Nishant Saxena ◽  
Christoph Persch ◽  
Matthias Wuttig ◽  
Anbarasu Manivannan

AbstractPhase change memory (PCM) offers remarkable features such as high-speed and non-volatility for universal memory. Yet, simultaneously achieving better thermal stability and fast switching remains a key challenge. Thus, exploring novel materials with improved characteristics is of utmost importance. We report here, a unique property-portfolio of high thermal stability and picosecond threshold switching characteristics in In3SbTe2 (IST) PCM devices. Our experimental findings reveal an improved thermal stability of amorphous IST compared to most other phase change materials. Furthermore, voltage dependent threshold switching and current-voltage characteristics corroborate an extremely fast, yet low electric field threshold switching operation within an exceptionally small delay time of less than 50 picoseconds. The combination of low electric field and high speed switching with improved thermal stability of IST makes the material attractive for next-generation high-speed, non-volatile memory applications.


2018 ◽  
Vol 11 (4) ◽  
pp. 041401 ◽  
Author(s):  
Wanliang Liu ◽  
Liangcai Wu ◽  
Tao Li ◽  
Zhitang Song ◽  
Jianjun Shi ◽  
...  

2012 ◽  
Vol 1431 ◽  
Author(s):  
Ramin Banan Sadeghian ◽  
Yusuf Leblebici ◽  
Ali Shakouri

ABSTRACTIn this work we present preliminary calculations and simulations to demonstrate feasibility of programming a nanoscale Phase Change Random Access Memory (PCRAM) cell by means of a silicon nanowire ballistic transistor (SNWBT). Memory cells based on ballistic transistors bear the advantage of having a small size and high-speed operation with low power requirements. A one-dimensional MOSFET model (FETToy) was used to estimate the output current of the nanowire as a function of its diameter. The gate oxide thickness was 1.5 nm, and the Fermi level at source was set to -0.32 eV. For the case of VDS = VGS = 1 V, when the nanowire diameter was increased from 1 to 60 nm, the output power density dropped from 109 to 106 W cm-2 , while the current increased from 20 to 90 μA. Finite element electro-thermal analysis were carried out on a segmented cylindrical phase-change memory cell made of Ge2Sb2Te5 (GST) chalcogenide, connected in series to the SNWBT. The diameter of the combined device, d, and the aspect ratio of the GST region were selected so as to achieve optimum heating of the GST. With the assumption that the bulk thermal conductivity of GST does not change significantly at the nanoscale, it was shown that for d = 24 nm, a ‘reset’ programming current of ID = 80 μA can heat the GST up to its melting point. The results presented herein can help in the design of low cost, high speed, and radiation tolerant nanoscale PCRAM devices.


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