Prediction of a Dynamically Stable New Half-Metallic Phase for the BaN and BaC Compounds

2018 ◽  
Vol 32 (7) ◽  
pp. 2031-2044 ◽  
Author(s):  
L. Beldi ◽  
H. Bendaoud ◽  
K. O. Obodo ◽  
B. Abbar ◽  
B. Bouhafs
Keyword(s):  
1998 ◽  
Vol 12 (29n31) ◽  
pp. 3359-3364
Author(s):  
D. Bagayoko ◽  
G. L. Zhao ◽  
J. D. Fan ◽  
J. T. Wang

We studied the electronic structure and optical properties of the low temperature (T = 0 K for the calculation) ferromagnetic phase of La3/4Ca1/4MnO3 using a self-consistent ab-initio LCAO method. We employed a local density potential. The calculated electronic structure suggests that the material is in a half-metallic state. The calculated average magnetic moment for the half-metallic phase is 3.75 μ B per Mn. This value is very close to the experimental values of 3.7 μ B per Mn. The real part of the optical conductivity, σ1(ω), from the direct band transitions, is predicted. The calculated optical conductivity shows that for photon energies below 2.4 eV, the electronic states of minority spin do not contribute to the optical transitions.


2012 ◽  
Vol 519 ◽  
pp. 174-178
Author(s):  
Tong Wei Li ◽  
La Chen ◽  
Yang Wang ◽  
Jin Cang Zhang

The electronic structures of the titanium-doped cubic perovskite ruthenates BaRu1-xTixO3 with x=0.125, 0.25, 0.375, 0.5, 0.625, 0.75, and 0.875 are investigated using the spin-polarized density functional theory within the pseudopotential plane wave method. It is found that a half-metallic phase appears in the 0.75- and 0.875-doped systems, and the origin of half-metallic property is the decrease of t2g bandwidth of Ru 4d states with the increase in x. In addition, the energy gap of BaRu0.25Ti0.75O3 is as large as 1.7 eV at the Fermi level in the up-spin density of states, which suggests a stable half-metallic phase can be obtained in the present systems.


Author(s):  
C. Hayzelden ◽  
J. L. Batstone

Epitaxial reordering of amorphous Si(a-Si) on an underlying single-crystal substrate occurs well below the melt temperature by the process of solid phase epitaxial growth (SPEG). Growth of crystalline Si(c-Si) is known to be enhanced by the presence of small amounts of a metallic phase, presumably due to an interaction of the free electrons of the metal with the covalent Si bonds near the growing interface. Ion implantation of Ni was shown to lower the crystallization temperature of an a-Si thin film by approximately 200°C. Using in situ transmission electron microscopy (TEM), precipitates of NiSi2 formed within the a-Si film during annealing, were observed to migrate, leaving a trail of epitaxial c-Si. High resolution TEM revealed an epitaxial NiSi2/Si(l11) interface which was Type A. We discuss here the enhanced nucleation of c-Si and subsequent silicide-mediated SPEG of Ni-implanted a-Si.Thin films of a-Si, 950 Å thick, were deposited onto Si(100) wafers capped with 1000Å of a-SiO2. Ion implantation produced sharply peaked Ni concentrations of 4×l020 and 2×l021 ions cm−3, in the center of the films.


1991 ◽  
Vol 1 (10) ◽  
pp. 1365-1370 ◽  
Author(s):  
N. D. Kush ◽  
V. N. Laukhin ◽  
A. I. Schegolev ◽  
E. B. Yagubskii ◽  
E. Yu. Alikberova ◽  
...  

1976 ◽  
Vol 37 (C4) ◽  
pp. C4-267-C4-270 ◽  
Author(s):  
B. BATLOGG ◽  
A. SCHLEGEL ◽  
P. WACHTER

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