Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed

2017 ◽  
Vol 37 (3) ◽  
pp. 857-876 ◽  
Author(s):  
Mai Kai Suan Tial ◽  
Yasunori Tanaka ◽  
Yuji Maruyama ◽  
Takumi Tsuchiya ◽  
Yoshihiko Uesugi ◽  
...  
1999 ◽  
Vol 63 (1) ◽  
pp. 2-8 ◽  
Author(s):  
Tadahiro Sakuta ◽  
Yasunori Tanaka ◽  
Makoto Katsuki ◽  
Takamasa Ishigaki

Metals ◽  
2018 ◽  
Vol 8 (8) ◽  
pp. 604
Author(s):  
Jang-Won Kang ◽  
Jong Park ◽  
Byung Choe ◽  
Seong Lee ◽  
Jung Park ◽  
...  

A method was developed to fabricate spherical Mo5Si3 powder by milling and spheroidizing using inductively coupled thermal plasma. A Mo5Si3 alloy ingot was fabricated by vacuum arc melting, after which it was easily pulverized into powder by milling due to its brittle nature. The milled powders had an irregular shape, but after being spheroidized by the thermal plasma treatment, they had a spherical shape. Sphericity was increased with increasing plasma power. After plasma treatment, the percentage of the Mo3Si phase had increased due to Si evaporation. The possibility of Si evaporation was thermodynamically analyzed based on the vapor pressure of Mo and Si in the Mo5Si3 liquid mixture. By this process, spherical Mo silicide powders with high purity could be fabricated successfully.


2019 ◽  
Vol 255 ◽  
pp. 126513 ◽  
Author(s):  
Jong-Min Park ◽  
Jang-Won Kang ◽  
Won-Hyuk Lee ◽  
Sung Yong Lee ◽  
Seok-Hong Min ◽  
...  

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