Cobalt diffusion in different microstructured WC-Co substrates during diamond chemical vapor deposition

Journal of Phase Equilibria and Diffusion ◽

10.1007/s11669-005-0027-2 ◽

2005 ◽

Vol 26 (5) ◽

pp. 411-416 ◽

Author(s):

G. Cabral ◽

N. Ali ◽

E. Titus ◽

J. Gracio

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Chemical Vapor Deposition

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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

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Soft ion impact for surface activation during diamond chemical-vapor deposition on diamond and silicon

Physical Review B ◽

10.1103/physrevb.64.125327 ◽

2001 ◽

Vol 64 (12) ◽

Author(s):

Kungen Teii

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Surface Activation ◽

Diamond Chemical Vapor Deposition

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Calculation of diamond chemical vapor deposition region in C–H–O phase diagram

Applied Physics Letters ◽

10.1063/1.117640 ◽

1996 ◽

Vol 69 (16) ◽

pp. 2370-2372 ◽

Author(s):

E. G. Rakov

Keyword(s):

Phase Diagram ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Chemical Vapor Deposition ◽

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Study of microwave discharge at high power density conditions in diamond chemical vapor deposition reactor by optical emission spectroscopy

Diamond and Related Materials ◽

10.1016/j.diamond.2019.04.030 ◽

2019 ◽

Vol 97 ◽

pp. 107407 ◽

Author(s):

S.A. Bogdanov ◽

A.M. Gorbachev ◽

A.L. Vikharev ◽

D.B. Radishev ◽

M.A. Lobaev

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Microwave Discharge ◽

Chemical Vapor ◽

Optical Emission ◽

High Power Density ◽

Chemical Vapor Deposition Reactor ◽

Diamond Chemical Vapor Deposition

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Computational simulation of diamond chemical vapor deposition in premixed C2H2/O2/H2 and CH4O2-strained flames

Combustion and Flame ◽

10.1016/0010-2180(93)90204-g ◽

1993 ◽

Vol 92 (1-2) ◽

pp. 144-160 ◽

Author(s):

Ellen Meeks ◽

Robert J. Kee ◽

David S. Dandy ◽

Michael E. Coltrin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Computational Simulation ◽

Chemical Vapor ◽

Diamond Chemical Vapor Deposition

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Analysis of optical emission spectroscopy in diamond chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00283-1 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1716-1721 ◽

Author(s):

Y Liao ◽

C.H Li ◽

Z.Y Ye ◽

C Chang ◽

G.Z Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Diamond Chemical Vapor Deposition

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Ion-to-CH3 flux ratio in diamond chemical-vapor deposition

Journal of Applied Physics ◽

10.1063/1.1506384 ◽

2002 ◽

Vol 92 (7) ◽

pp. 4103-4108 ◽

Author(s):

Kungen Teii ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Chemical Vapor Deposition

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Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO–CH4–H2 plasmas

Journal of Applied Physics ◽

10.1063/1.1686900 ◽

2004 ◽

Vol 95 (8) ◽

pp. 4463-4470 ◽

Author(s):

Kungen Teii ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Analytical Study ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Pressure Limit ◽

Diamond Chemical Vapor Deposition

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Detection of C2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00420-9 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 388-392 ◽

Author(s):

T. Shiomi ◽

H. Nagai ◽

K. Kato ◽

M. Hiramatsu ◽

M. Nawata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Source ◽

Low Pressure ◽

Inductively Coupled ◽

Diamond Chemical Vapor Deposition

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Theoretical analysis of the diffusive ion in biased plasma enhanced diamond chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1389524 ◽

2001 ◽

Vol 90 (5) ◽

pp. 2559-2564 ◽

Author(s):

R. Saito ◽

J. Sano ◽

N. Ishigaki ◽

T. Kimura ◽

S. Yugo

Keyword(s):

Chemical Vapor Deposition ◽

Theoretical Analysis ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Chemical Vapor Deposition

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