‘Forming limit’ or ‘instability limit’ diagrams are particularly useful in the processing of sheet materials by deep drawing or stretch forming. The key to the development of these diagrams is a quantitative characterization of the localized state of strain at various stages throughout the forming process. A novel approach has been developed whereby the distortions of a high-resolution grid, i.e. the strain analysis, are accurately monitored by scanning electron microscopy. A concurrent characterization of the associated surface structure is obtained.The grid for strain analysis is produced by a photoresist technique. Any practical grid master pattern may be used; the most useful shapes for the current studies are rectangles, squares, or circles with a resolution to 200 lines per inch. Photoresist emulsion is applied directly to the sheet specimen surface and air cured. The master pattern is then held secure against the emulsion by vacuum and the composite assembly exposed to ultraviolet light.