Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment
2015 ◽
Vol 46
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pp. 56-69
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2007 ◽
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pp. 1827
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2008 ◽
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2005 ◽
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2012 ◽
Vol 206
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pp. 2459-2463
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