Characterization of cobalt films grown on MgO(001) by dc-biased-sputter deposition

1996 ◽  
Vol 166 (1-4) ◽  
pp. 792-797 ◽  
Author(s):  
Mituru Hashimoto ◽  
Hong Qiu ◽  
Tatsuya Ohbuchi ◽  
Miklos Adamik ◽  
Hisashi Nakai ◽  
...  
Keyword(s):  
Sputter Deposition ◽  
Cobalt Films

Structural Characterization of Epitaxial GMR Magnetic Multilayers and Spin Valves Grown by Sputter Deposition

2000 ◽  
Vol 614 ◽  
Author(s):  
H. Geng ◽  
R. Loloee ◽  
J.W. Heckman ◽  
J. Bass ◽  
W.P. Pratt ◽  
...  
Keyword(s):  
High Resolution ◽  
Epitaxial Growth ◽  
Magnetic Multilayers ◽  
Sputter Deposition ◽  
Dc Magnetron Sputtering ◽  
Cu Films ◽  
Electron Backscatter ◽  
High Resolution Tem ◽  
Fcc Structure

ABSTRACTEpitaxial Cu/Py/FeMn and (Cu/Co)×20 GMR magnetic multilayers were grown on single crystal (011) Nb that was deposited on (1121) Al2O3 substrates by dc magnetron sputtering. Electron backscatter patterns (EBSPs) revealed that the Cu films display two twin variants, corresponding to two stacking sequences of {111} planes in fcc. The epitaxial orientation relationship between the bcc Nb and both fcc Cu variants was the Nishiyama-Wasserman (N-W) relationship. Conventional TEM observations revealed epitaxial growth for both the Cu/Py/FeMn and (Cu/Co)×20 multilayers. High-resolution TEM confirmed epitaxial growth of close packed (011) Nb on (1120) Al2O3 substrates with [111]Nb∥[0001]Al2O3. Numerous small twins were observed in the Cu near the Cu-Nb interface of the Cu/Py/FeMn multilayer. In the Cu/Co multilayer, the growth planes of the Cu and Co were found to be {100} instead of the expected close-packed {111} planes of the fcc structure.

Electrical characterization of sputter-deposition-induced defects in epitaxially grown n-GaAs layers

Vacuum ◽  
1995 ◽  
Vol 46 (8-10) ◽  
pp. 1087-1090 ◽  
Author(s):  
F Danie Auret ◽  
SA Goodman ◽  
G Myburg ◽  
WO Barnard
Keyword(s):  
Electrical Characterization ◽  
Sputter Deposition ◽  
Induced Defects

Analysis and characterization of In-film defects generated during sputter deposition of aluminum-alloy films

1998 ◽  
Author(s):  
Murali Abburi ◽  
Vikram Pavate ◽  
Sunny Chiang ◽  
Keith Hansen ◽  
Glen Mori ◽  
...  
Keyword(s):  
Aluminum Alloy ◽  
Sputter Deposition ◽  
Alloy Films

FMR, XRD and XHRTEM characterization of stresses in an epitaxial Ni–Cu film prepared on MgO(001) by d.c. biased plasma sputter deposition

1997 ◽  
Vol 299 (1-2) ◽  
pp. 59-62 ◽  
Author(s):  
Hiroko Maruyama ◽  
Hong Qiu ◽  
Mituri Hashimoto ◽  
Kazuyoshi Fudaba ◽  
Hisashi Nakai ◽  
...  
Keyword(s):  
Sputter Deposition ◽  
Cu Film

Sputter deposition and characterization of Mn3CuN thin films

2013 ◽  
Vol 577 ◽  
pp. S314-S317 ◽  
Author(s):  
Masahiro Aoyama ◽  
Koshi Takenaka ◽  
Hiroshi Ikuta
Keyword(s):  
Thin Films ◽  
Sputter Deposition
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