Interaction of nitrogen and ammonia plasmas with polystyrene and polycarbonate studied by X-ray photoelectron spectroscopy, neutron activation analysis and static secondary ion mass spectrometry

Polymer ◽  
1989 ◽  
Vol 30 (1) ◽  
pp. 40-44 ◽  
Author(s):  
J. Lub ◽  
F.C.B.M. van Vroonhoven ◽  
E. Bruninx ◽  
A. Benninghoven
Keyword(s):  
Mass Spectrometry ◽  
Neutron Activation Analysis ◽  
Activation Analysis ◽  
Neutron Activation ◽  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
X Ray ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Static Secondary Ion Mass Spectrometry and X-Ray Photoelectron Spectroscopy of Deuterium- and Methyl-Substituted Polystyrene

1991 ◽  
Vol 45 (2) ◽  
pp. 209-217 ◽  
Author(s):  
Ashutosh Chilkoti ◽  
David G. Castner ◽  
Buddy D. Ratner
Keyword(s):  
Mass Spectrometry ◽  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
X Ray ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

XPS and Sims Studies of CVD-GROWN Cubic SiC Films on Si(100)

1994 ◽  
Vol 339 ◽  
Author(s):  
A. T. S. Wee ◽  
Z. C. Feng ◽  
H. H. Hng ◽  
K. L. Tan ◽  
C. C. Tin ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Photoelectron Spectroscopy ◽  
Chemical Etching ◽  
Secondary Ion Mass Spectrometry ◽  
Growth Time ◽  
X Ray ◽  
Ion Mass Spectrometry ◽  
Compositional Variations ◽  
Secondary Ion ◽  
Sic Films

ABSTRACTA series of CVD-grown 3C-SiC/Si(100) films of different growth times, and hence film thicknesses, are studied by X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). XPS showed that the surfaces of the samples consist of Si oxides (SiO2 and SiOx where x < 2) and unreacted C.H. Unreacted elemental Si is also present and its amount decreases with increasing growth time. This surface overlayer is further investigated by changing the photoelectron take-off angle and from chemical etching studies. Compositional variations of the SiC films are also studied using SIMS.

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