Molecular emission characteristics of various fluorides in a low-temperature-hydrogen diffusion flame

Talanta ◽  
1971 ◽  
Vol 18 (2) ◽  
pp. 155-164 ◽  
Author(s):  
R.M. Dagnall ◽  
B. Fleet ◽  
T.H. Risby ◽  
D.R. deans
Keyword(s):  
Low Temperature ◽  
Diffusion Flame ◽  
Hydrogen Diffusion ◽  
Emission Characteristics ◽  
Molecular Emission

The Turbulent Hydrogen Diffusion Flame in a Cross-wind

1975 ◽  
Vol 11 (1-2) ◽  
pp. 29-33 ◽  
Author(s):  
T. A. BRZUSTOWSKI ◽  
S. R. GOLLAHALLI ◽  
H. F. SULLIVAN
Keyword(s):  
Diffusion Flame ◽  
Hydrogen Diffusion

Low-Temperature Diffusivity of Hydrogen in Different Silicon Substrates

1995 ◽  
Vol 378 ◽  
Author(s):  
Xiaojun Deng ◽  
Bhushan L. Sopori
Keyword(s):  
Low Temperature ◽  
Carbon Content ◽  
Oxygen Concentration ◽  
Hydrogen Diffusion ◽  
Growth Conditions ◽  
Growth Speed ◽  
Silicon Substrates ◽  
Vacancy Mechanism ◽  
Speed Increase

AbstractThe diffusivity of deuterium (D) at 250°C was determined in silicon samples grown by different techniques. It is found that the diffusivity increases with the growth speed, increase in carbon content and a decrease in oxygen concentration of the substrate. These growth conditions correlate well with the concentration of vacancy-type defects in the as-grown state. Hence, we conclude that a vacancy mechanism is responsible for low-temperature hydrogen diffusion in silicon. The highest diffusivity for hydrogen, calculated from these data, was found to be 3 × 10−7 cm2/s.

Field emission characteristics of carbon nanofibers grown on copper micro-tips at low temperature

Vacuum ◽  
2008 ◽  
Vol 82 (5) ◽  
pp. 551-555 ◽  
Author(s):  
Woo Yong Sung ◽  
Wal Jun Kim ◽  
Ho Young Lee ◽  
Yong Hyup Kim
Keyword(s):  
Low Temperature ◽  
Carbon Nanofibers ◽  
Field Emission ◽  
Emission Characteristics

Self‐Absorption in the Sodium Plus Active‐Hydrogen Diffusion Flame

1964 ◽  
Vol 40 (7) ◽  
pp. 2054-2055 ◽  
Author(s):  
E. M. Nemeth ◽  
J. C. Polanyi ◽  
C. M. Sadowski
Keyword(s):  
Diffusion Flame ◽  
Hydrogen Diffusion ◽  
Active Hydrogen

Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

1998 ◽  
Vol 509 ◽  
Author(s):  
A.N. Titkov ◽  
A.I. Kosarev ◽  
A.J. Vinogradov ◽  
Z. Waqar ◽  
I.V. Makarenko ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Low Temperature ◽  
Field Emission ◽  
Significant Influence ◽  
Substrate Surface ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

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