Chemical vapour deposition of boron carbide from BBr3CH4H2 mixtures in a microwave plasma

V Cholet; R Herbin; L Vandenbulcke

doi:10.1016/0040-6090(90)90200-w

Chemical vapour deposition of boron carbide from BBr3CH4H2 mixtures in a microwave plasma

Thin Solid Films ◽

10.1016/0040-6090(90)90200-w ◽

1990 ◽

Vol 188 (1) ◽

pp. 143-155 ◽

Cited By ~ 26

Author(s):

V Cholet ◽

R Herbin ◽

L Vandenbulcke

Keyword(s):

Boron Carbide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Cited By ~ 5

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

X Ray

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Cited By ~ 40

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of low resistivity tungsten thin films deposited by microwave-plasma-enhanced chemical vapour deposition from the tungsten hexafluoride-hydrogen system

Thin Solid Films ◽

10.1016/0040-6090(94)90446-4 ◽

1994 ◽

Vol 241 (1-2) ◽

pp. 301-304 ◽

Cited By ~ 3

Author(s):

A. Belkacem ◽

Y. Arnal ◽

J. Pelletier ◽

E. André ◽

J.C. Oberlin

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Low Resistivity ◽

Hydrogen System ◽

Tungsten Hexafluoride

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Synthesis of 3-dimensional porous graphene nanosheets using electron cyclotron resonance plasma enhanced chemical vapour deposition

RSC Advances ◽

10.1039/c5ra09087c ◽

2015 ◽

Vol 5 (103) ◽

pp. 84927-84935 ◽

Cited By ~ 10

Author(s):

Rajesh Thomas ◽

G. Mohan Rao

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Graphene Nanosheets ◽

Chemical Vapour ◽

Hydrogen Gas ◽

3 Dimensional ◽

Gas Molecules ◽

Resonance Plasma

Microwave plasma driven chemical vapour deposition was used to synthesize graphene nanosheets from a mixture of acetylene and hydrogen gas molecules.

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Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995570 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-593-C5-600 ◽

Cited By ~ 1

Author(s):

C. Tixier ◽

P. Tristant ◽

J. Desmaison ◽

D. Merle

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Growth Rates ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission

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Remote microwave plasma enhanced chemical vapour deposition of alumina on metallic substrates

Surface and Coatings Technology ◽

10.1016/s0257-8972(99)00495-8 ◽

1999 ◽

Vol 120-121 ◽

pp. 233-237 ◽

Cited By ~ 3

Author(s):

M.C. Ntsama-Etoundi ◽

J. Desmaison ◽

P. Tristant ◽

C. Tixier

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Metallic Substrates

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SURFACE PROCESSES AND RATE-DETERMINING STEPS IN PLASMA-INDUCED CHEMICAL VAPOUR DEPOSITION: TITANIUM NITRIDE, BORON CARBIDE AND SILICON

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50024-3 ◽

1990 ◽

pp. 154-166

Author(s):

S. VEPŘEK

Keyword(s):

Titanium Nitride ◽

Boron Carbide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Surface Processes ◽

Rate Determining Steps

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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