An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

1993 ◽  
Vol 2 (2-4) ◽  
pp. 558-561 ◽  
Author(s):  
S. Haq ◽  
C. Somerton ◽  
D. Tunnicliffe ◽  
J.A. Savage ◽  
P. John ◽  
...  
2007 ◽  
Vol 336-338 ◽  
pp. 1776-1779
Author(s):  
Chong Mu Lee ◽  
Kyung Ha Kim

Diamond-like carbon (DLC) films have been deposited by radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) with different Ar-CH4 mixtures. Nanocrystalline diamond films have been deposited by microwave plasma-enhanced chemical vapour deposition (MPCVD), using Ar-H2-CH4 mixtures. X-ray photoelectron spectroscopy (XPS) and nanotribological investigation (by scanning force microscopy) have been used to compare the mechanical properties and structures of these films. Highly orientated and non-orientated microcrystalline diamond films and MPCVD-produced amorphous carbon have also been studied by way of comparison. The diamond films exhibit a linear relationship between roughness and the coefficient of friction. The DLC and amorphous carbon have higher friction coefficients than the best performing diamond film, but may more easily be deposited as smooth coating. Possible applications for these various carbon-based films include microelectromechanical components, for which smooth, hard coatings are required.


1998 ◽  
Vol 76 (11) ◽  
pp. 1559-1563
Author(s):  
J Hugh Horton ◽  
Johann Rasmusson ◽  
Joseph G Shapter ◽  
Peter R Norton

The adsorption of the organometallic compounds bis(hexafluoroacetylacetonato)zinc(II) (Zn(hfac)2) and bis(hexafluoroacetylacetonato)nickel(II) (Ni(hfac)2) on the surface of Si(111)-7×7 were studied by a combination of scanning tunnelling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). These compounds are analogues of the compound bis(hexafluoroacetylacetonato)copper(II), which is an important precursor for the chemical vapour deposition of copper that we have previously studied. Both XPS and STM results indicate that the Zn(hfac)2 is adsorbed intact on the surface, and remains intact on the surface at temperatures up to 300 K. The XPS shows a transition from a physisorbed state to a chemisorbed state at temperatures between 160 and 300 K. At higher temperatures Zn(hfac)2 decomposed to form Zn and fluorocarbon fragments. The metal component diffused into the substrate. The Ni(hfac)2 complex could not be successfully adsorbed on the Si surface: it was shown that this was due to decomposition of the molecule in the vapour phase, probably due to the higher temperatures needed to evaporate this relatively involatile compound.Key words: scanning tunnelling microscopy, chemical vapour deposition, zinc, copper.


2008 ◽  
Vol 254 (20) ◽  
pp. 6400-6409 ◽  
Author(s):  
Bernard Humbert ◽  
Nesrine Hellala ◽  
Jean Jacques Ehrhardt ◽  
Silvère Barrat ◽  
Elizabeth Bauer-grosse

1989 ◽  
Vol 67 (4) ◽  
pp. 190-194 ◽  
Author(s):  
S. Blain ◽  
J. E. Klemberg-Sapieha ◽  
M. R. Wertheimer ◽  
S. C. Gujrathi

Plasma silicon nitride (P-SiN), oxynitride (P-SiON), and silicon dioxide (P-SiO2) films have been prepared from SiH4–NH3–N2O mixtures in a large volume microwave plasma (LMPR, 2.45 GHz) apparatus at TS = 280 °C. Film compositions, determined by X-ray photoelectron spectroscopy and nuclear elastic recoil detection analysis, reveal about 15 at.% hydrogen in P-SiN, <2% in P-SiO2, and intermediate values in P-SiON. Various physicochemical and electrical properties (density, refractive index, intrinsic stress, permittivity, and conductivity) vary systematically with film composition, O/(O + N), determined from the above analyses. The present microwave plasma enhanced chemical vapour deposition (PECVD) films compare favorably with the best PECVD and low pressure chemical vapour deposition (LPCVD) materials reported in the literature.


Materials ◽  
2021 ◽  
Vol 15 (1) ◽  
pp. 5
Author(s):  
Lidia Mosińska ◽  
Robert Szczęsny ◽  
Marek Trzcinski ◽  
Mieczysław Karol Naparty

Diamond is a very interesting material with a wide range of properties, making it highly applicable, for example, in power electronics, chemo- and biosensors, tools’ coatings, and heaters. Due to the high demand for this innovative material based on the properties it is already expected to have, it is important to obtain homogeneous diamond layers for specific applications. Doping is often chosen to modify the properties of layers. However, there is an alternative way to achieve this goal and it is shown in this publication. The presented research results reveal that the change in methanol content during the Hot Filament Chemical Vapour Deposition (HF CVD) process is a sufficient factor to tune the properties of deposited layers. This was confirmed by analysing the properties of the obtained layers, which were determined using Raman spectroscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD), and an atomic force microscope (AFM), and the results were correlated with those of X-ray photoelectron spectroscopy (XPS). The results showed that the increasing of the concentration of methanol resulted in a slight decrease in the sp3 phase content. At the same time, the concentration of the -H, -OH, and =O groups increased with the increasing of the methanol concentration. This affirmed that by changing the content of methanol, it is possible to obtain layers with different properties.


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