For the 1:1 laser projection lithography system used to achieve large-area patterning with
higher resolutions as well as higher throughput, the key parameters such as the laser beam
geometry, the numerical aperture of projection lens, the laser source power and the pulse repetition
rate are theoretically analyzed. It is expounded the process of uniform exposure in hexagonal beam
shape, the advantages and limitations of 1:1 projection owing to numerical apertures deciding the
resolution, as well as the cause of choosing larger laser power and pulse repetition rate. Meanwhile,
the projection lens for a unit-magnification, refractive imaging system is tentatively simulationdesigned
using ZEMAX optical design software. The optimized three-dimensional layout is plotted.
For the designed results, the maximum optical path difference is smaller thanλ /4 within entire
visual field. The resolution for feature sizes 10μm can be achieved within depth of focus 400μm by
evaluating MTF. The maximum field curvature is within 10μm and the maximum distortion is small
than 0.000007%. This fulfills the demands in technical specifications.