In situ thin films of YBa2Cu3O7 prepared by single target DC-magnetron sputtering

1989 ◽  
Vol 158 (1-2) ◽  
pp. 293-297 ◽  
Author(s):  
J.-M. Triscone ◽  
M.G. Karkut ◽  
O. Brunner ◽  
L. Antognazza ◽  
M. Decroux ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Single Target

Epitaxial Growth of Bi 2 Sr 2-x La x Cu 1 O 6+δ Thin Films by In-Situ dc Magnetron Sputtering

1998 ◽  
Vol 15 (5) ◽  
pp. 373-375 ◽  
Author(s):  
Ying-zi Zhang ◽  
Duo-gui Yang ◽  
Lin Li ◽  
Bai-ru Zhao ◽  
Shun-lian Jia ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Epitaxial Growth ◽  
Dc Magnetron Sputtering

In situ superconducting Y−Ba−Cu−O thin films by single-target r.f. magnetron sputtering

1991 ◽  
Vol 13 (4) ◽  
pp. 477-483
Author(s):  
A. Andreone ◽  
A. Barone ◽  
A. Di Chiara ◽  
F. Miletto Granozio ◽  
G. Peluso ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Single Target

Adhesion Study in Aluminum/Polyimide System

1998 ◽  
Vol 511 ◽  
Author(s):  
S. H. Yoo ◽  
S. J. Heo ◽  
Y.-H. Kim ◽  
B. J. Han ◽  
J. H. Yoon
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Plasma Treatment ◽  
Peel Strength ◽  
Rf Plasma ◽  
Dc Magnetron Sputtering ◽  
Curing Conditions ◽  
Curing Condition ◽  
Pi System

ABSTRACTThe effects of RF plasma precleaning and polyimide curing conditions on the peel strength have been studied. polyimide precursors of BG-2480 (Toray) and PI-2611 (Du Pont) were spincoated and cured under the various conditions. Cured polyimide substrates were in-situ Ar+ RF plasma cleaned prior to metal deposition. Al-2%Si or Al-0.5%Cu-1%Si thin films were deposited onto polyimide substrates using DC magnetron sputtering.The peel strength was enhanced by RF plasma treatment. The Al/modified PI specimen failed cohesively in the polyimide. The polyimide curing condition strongly affects the peel strength in the Al/modified PI system.

Superconducting Thin Films of Bi-Pb-Sr-Ca-Cu-O by dc Magnetron Sputtering from a Single Target

1988 ◽  
Vol 27 (Part 2, No. 11) ◽  
pp. L2091-L2093 ◽  
Author(s):  
Yoshinori Hakuraku ◽  
Yoshinari Aridome ◽  
Tetsuya Ogushi
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Superconducting Thin Films ◽  
Dc Magnetron Sputtering ◽  
Single Target

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno
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