In-situ and ex-situ studies of molybdenum thin films deposited by rf and dc magnetron sputtering

ABSTRACTThe effects of RF plasma precleaning and polyimide curing conditions on the peel strength have been studied. polyimide precursors of BG-2480 (Toray) and PI-2611 (Du Pont) were spincoated and cured under the various conditions. Cured polyimide substrates were in-situ Ar+ RF plasma cleaned prior to metal deposition. Al-2%Si or Al-0.5%Cu-1%Si thin films were deposited onto polyimide substrates using DC magnetron sputtering.The peel strength was enhanced by RF plasma treatment. The Al/modified PI specimen failed cohesively in the polyimide. The polyimide curing condition strongly affects the peel strength in the Al/modified PI system.

Download Full-text

High-quality MgB2 thin films in situ grown by dc magnetron sputtering

Superconductor Science and Technology ◽

10.1088/0953-2048/15/8/312 ◽

2002 ◽

Vol 15 (8) ◽

pp. 1236-1239 ◽

Cited By ~ 29

Author(s):

R Vaglio ◽

M G Maglione ◽

R Di Capua

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

High Quality ◽

Mgb2 Thin Films

Download Full-text

In situ thin films of YBa2Cu3O7 prepared by single target DC-magnetron sputtering

Physica C Superconductivity ◽

10.1016/0921-4534(89)90333-x ◽

1989 ◽

Vol 158 (1-2) ◽

pp. 293-297 ◽

Cited By ~ 37

Author(s):

J.-M. Triscone ◽

M.G. Karkut ◽

O. Brunner ◽

L. Antognazza ◽

M. Decroux ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Single Target

Download Full-text

Structure and Epitaxial Behavior of Rutile TiO2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.605.487 ◽

2014 ◽

Vol 605 ◽

pp. 487-490 ◽

Cited By ~ 1

Author(s):

Tomas Roch ◽

Pavol Durina ◽

Martin Truchly ◽

Tomas Plecenik ◽

Branislav Grancic ◽

...

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Magnetron Sputtering ◽

Rutile Phase ◽

Ex Situ ◽

Nanocrystalline Phase ◽

Dc Magnetron Sputtering ◽

Epitaxial Relationship ◽

Force Microscopy ◽

Long Term Stability

Titanium dioxide gas sensors are typically employing metastable anatase nanocrystalline phase. Operation at high temperature can thus negatively affect their long term stability. Employment of rutile phase with strong texture and larger grain size may ensure better reliability and longer lifetime. Therefore in this work we study the possibility to utilize stable rutile phase thin films prepared at relatively low temperature on c-cut sapphire substrates. Technological conditions have been chosen in order to obtain highly oriented titanium dioxide rutile thin films using reactive DC magnetron sputtering on unheated substrates. Subsequent ex-situ annealing in temperature range from 500°C to 800°C leads to increase of crystallite size and improvement of in-plane preferential orientation. Surface topography has been characterized by atomic force microscopy. Structure, texture and the strain evolution has been investigated using x-ray diffraction measurements. All investigated thin films showed epitaxial relationship with respect to the substrate: rutile-TiO2(100)[00 || Al2O3(0001)[10. Sensitivity of such rutile films to hydrogen has been measured and compared with our previous results on anatase thin films.

Download Full-text

Ex situ annealing effect on Nb thin films prepared by DC magnetron sputtering

Physica C Superconductivity ◽

10.1016/j.physc.2011.05.156 ◽

2011 ◽

Vol 471 (21-22) ◽

pp. 1193-1195 ◽

Cited By ~ 2

Author(s):

Y.W. Kim ◽

S.-G. Lee ◽

J.-H. Choi

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Annealing Effect ◽

Ex Situ ◽

Dc Magnetron Sputtering

Download Full-text

The use of transmission and analytical electron microscopy in studying reactions and phase transformations in thin film

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100150046 ◽

1993 ◽

Vol 51 ◽

pp. 842-843

Author(s):

K. Barmak

Keyword(s):

Thin Film ◽

Thin Films ◽

Phase Transformations ◽

Analytical Electron Microscopy ◽

Ex Situ ◽

Multilayer Thin Films ◽

Absolute Concentration ◽

Analytical Electron ◽

Deposition Step

Generally, processing of thin films involves several annealing steps in addition to the deposition step. During the annealing steps, diffusion, transformations and reactions take place. In this paper, examples of the use of TEM and AEM for ex situ and in situ studies of reactions and phase transformations in thin films will be presented.The ex situ studies were carried out on Nb/Al multilayer thin films annealed to different stages of reaction. Figure 1 shows a multilayer with dNb = 383 and dAl = 117 nm annealed at 750°C for 4 hours. As can be seen in the micrograph, there are four phases, Nb/Nb3-xAl/Nb2-xAl/NbAl3, present in the film at this stage of the reaction. The composition of each of the four regions marked 1-4 was obtained by EDX analysis. The absolute concentration in each region could not be determined due to the lack of thickness and geometry parameters that were required to make the necessary absorption and fluorescence corrections.

Download Full-text