Comment on “Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition”, Diamond relat. mater., 3 (1994) 264–269

Diamond and Related Materials ◽

10.1016/0925-9635(94)90134-1 ◽

1994 ◽

Vol 3 (10) ◽

pp. 1277-1278 ◽

Author(s):

K.J. Boyd ◽

D. Marton ◽

S.S. Todorov ◽

A.H. Al-Bayati ◽

J.W. Rabalais

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90090-6 ◽

1994 ◽

Vol 3 (3) ◽

pp. 264-269 ◽

Author(s):

M. Diani ◽

A. Mansour ◽

L. Kubler ◽

J.L. Bischoff ◽

D. Bolmont

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Reply to the comment on “Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition”, Diamond relat. mater., 3 (1994) 264–269

Diamond and Related Materials ◽

10.1016/0925-9635(94)90135-x ◽

1994 ◽

Vol 3 (10) ◽

pp. 1279 ◽

Author(s):

M. Diani ◽

A. Mansour ◽

L. Kubler ◽

J.L. Bischoff ◽

D. Bolmont

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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The Structure and Bonding State for Fullerene-Like Carbon Nitride Films with High Hardness Formed by Electron Cyclotron Resonance Plasma Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.125602 ◽

2012 ◽

Vol 51 ◽

pp. 125602 ◽

Author(s):

Tomoyuki Kamata ◽

Osamu Niwa ◽

Shigeru Umemura ◽

Shigeru Hirono

Keyword(s):

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

High Hardness ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Bonding State ◽

Plasma Sputtering ◽

Structure And Bonding ◽

Resonance Plasma

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Electron-Cyclotron-Resonance Plasma Deposition of Carbon onto Silicon

Springer Proceedings in Physics - Amorphous and Crystalline Silicon Carbide II ◽

10.1007/978-3-642-75048-9_12 ◽

1989 ◽

pp. 60-65

Author(s):

J. Pankove ◽

V. Hornback ◽

S. Sritharan ◽

J. Wilson ◽

S. Asher ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583518 ◽

1986 ◽

Vol 4 (4) ◽

pp. 818 ◽

Author(s):

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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An electron cyclotron resonance plasma deposition technique employing magnetron mode sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575588 ◽

1988 ◽

Vol 6 (4) ◽

pp. 2348-2352 ◽

Author(s):

Chiharu Takahashi ◽

Mikiho Kiuchi ◽

Toshiro Ono ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Deposition Technique ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Composition and crystal structure of carbon nitride films prepared by the electron cyclotron resonance plasma sputtering method

Applied Physics Letters ◽

10.1063/1.122235 ◽

1998 ◽

Vol 73 (12) ◽

pp. 1652-1654 ◽

Author(s):

Youji Tani ◽

Yoshifumi Aoi ◽

Eiji Kamijo

Keyword(s):

Crystal Structure ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition and etching of silicon nitride on GaSb for optoelectronic applications

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90085-x ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 369-373

Author(s):

R. Bonnot ◽

A. Gouskov ◽

G. Bougnot

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optoelectronic Applications ◽

Resonance Plasma

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Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition

Applied Physics Letters ◽

10.1063/1.112272 ◽

1994 ◽

Vol 65 (6) ◽

pp. 696-698 ◽

Author(s):

A. Bousetta ◽

M. Lu ◽

A. Bensaoula ◽

A. Schultz

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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