Real-time spectroscopic ellipsometry studies of diamond film growth by microwave plasma-enhanced chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90198-8 ◽

1994 ◽

Vol 3 (4-6) ◽

pp. 431-437 ◽

Author(s):

Byungyou Hong ◽

M. Wakagi ◽

R.W. Collins ◽

Ilsin An ◽

N.C. Engdahl ◽

...

Keyword(s):

Real Time ◽

Chemical Vapour Deposition ◽

Spectroscopic Ellipsometry ◽

Diamond Film ◽

Vapour Deposition ◽

Film Growth ◽

Microwave Plasma ◽

Chemical Vapour ◽

Diamond Film Growth

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Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08648-8 ◽

1996 ◽

Vol 281-282 ◽

pp. 264-266 ◽

Author(s):

Akimitsu Hatta ◽

Hidetoshi Suzuki ◽

Ken-ichi Kadota ◽

Toshimichi Ito ◽

Akio Hiraki

Keyword(s):

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Film Growth ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Diamond Film Growth

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Atomic-Scale Kinetic Monte Carlo Simulation of {100} -Oriented Diamond Film Growth in C-H and C-H-Cl Systems by Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/19/7/343 ◽

2002 ◽

Vol 19 (7) ◽

pp. 1019-1020 ◽

Author(s):

An Xi-Zhong ◽

Zhang Yu ◽

Liu Guo-Quan ◽

Qin Xiang-Ge ◽

Wang Fu-Zhong ◽

...

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Film Growth ◽

Kinetic Monte Carlo ◽

Chemical Vapour ◽

Atomic Scale ◽

Diamond Film Growth

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Application of real-time spectroscopic ellipsometry for the development of low-temperature diamond film growth processes

Thin Solid Films ◽

10.1016/s0040-6090(97)00874-2 ◽

1998 ◽

Vol 313-314 ◽

pp. 506-510 ◽

Author(s):

Joungchel Lee ◽

Byungyou Hong ◽

R Messier ◽

R.W Collins

Keyword(s):

Low Temperature ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Diamond Film ◽

Film Growth ◽

Growth Processes ◽

Diamond Film Growth

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Real time spectroellipsometry for optimization of diamond film growth by microwave plasma‐enhanced chemical vapor deposition from CO/H2mixtures

Journal of Applied Physics ◽

10.1063/1.363668 ◽

1996 ◽

Vol 80 (11) ◽

pp. 6489-6495 ◽

Author(s):

Joungchel Lee ◽

Byungyou Hong ◽

R. Messier ◽

R. W. Collins

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Diamond Film ◽

Vapor Deposition ◽

Film Growth ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Film Growth

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Chemical vapour deposition of boron carbide from BBr3CH4H2 mixtures in a microwave plasma

Thin Solid Films ◽

10.1016/0040-6090(90)90200-w ◽

1990 ◽

Vol 188 (1) ◽

pp. 143-155 ◽

Author(s):

V Cholet ◽

R Herbin ◽

L Vandenbulcke

Keyword(s):

Boron Carbide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of low resistivity tungsten thin films deposited by microwave-plasma-enhanced chemical vapour deposition from the tungsten hexafluoride-hydrogen system

Thin Solid Films ◽

10.1016/0040-6090(94)90446-4 ◽

1994 ◽

Vol 241 (1-2) ◽

pp. 301-304 ◽

Author(s):

A. Belkacem ◽

Y. Arnal ◽

J. Pelletier ◽

E. André ◽

J.C. Oberlin

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Low Resistivity ◽

Hydrogen System ◽

Tungsten Hexafluoride

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