Transport properties of doped silicon oxycarbide microcrystalline films produced by spatial separation techniques

1996 ◽  
Vol 41-42 ◽  
pp. 493-517 ◽  
Author(s):  
R MARTINS ◽  
M VIEIRA ◽  
I FERREIRA ◽  
E FORTUNATO ◽  
L GUIMARAES
1994 ◽  
Vol 358 ◽  
Author(s):  
R. Martins ◽  
M. Vieira ◽  
I. Ferreira ◽  
E. Fortunato

ABSTRACTThis work presents experimental data concerning the role of the oxygen partial pressure used during the preparation process, on the structure, composition and optoelectronic properties of wide band gap doped microcrystalline silicon oxycarbide films produced by a TCDDC system [1].


2004 ◽  
Vol 24 (4) ◽  
pp. 601-605 ◽  
Author(s):  
Yujun Zhang ◽  
Alberto Quaranta ◽  
Gian Domenico Soraru

2017 ◽  
Vol 694 ◽  
pp. 946-951 ◽  
Author(s):  
Zhenxu Lin ◽  
Rui Huang ◽  
Huaipei Wang ◽  
Yan Wang ◽  
Yi Zhang ◽  
...  

2019 ◽  
Vol 103 (3) ◽  
pp. 1732-1743 ◽  
Author(s):  
Bin Du ◽  
Junjie Qian ◽  
Ping Hu ◽  
Chao He ◽  
Mei Cai ◽  
...  

2006 ◽  
Vol 140 (3-4) ◽  
pp. 192-196 ◽  
Author(s):  
S.B. Ma ◽  
Y.P. Sun ◽  
B.C. Zhao ◽  
P. Tong ◽  
X.B. Zhu ◽  
...  

1994 ◽  
Vol 336 ◽  
Author(s):  
R. Martins ◽  
I. Ferreira ◽  
E. Fortunato ◽  
M. Vieira

ABSTRACTSilicon oxycarbide microcrystalline layers, n- and p-doped, highly conductive and highly transparent have been produced using a Two Consecutive Decomposition and Deposition Chamber (TCDDC) system. The films exhibit suitable properties for optoelectronic applications where wide band gap materials with required conductivity and stability are needed. In this paper we present the role of partial oxygen pressure (po2) in controlling the composition, structure and transport properties (conductivity, σd and optical gap, Eop) of silicon oxycarbide microcrystalline layers.


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