Role of oxygen partial pressure on the properties of doped silicon oxycarbide microcrystalline layers produced by spatial separation techniques

1995 ◽  
Vol 13 (4) ◽  
pp. 2199-2209 ◽  
Author(s):  
R. Martins ◽  
M. Vieira ◽  
I. Ferreira ◽  
E. Fortunato
1994 ◽  
Vol 358 ◽  
Author(s):  
R. Martins ◽  
M. Vieira ◽  
I. Ferreira ◽  
E. Fortunato

ABSTRACTThis work presents experimental data concerning the role of the oxygen partial pressure used during the preparation process, on the structure, composition and optoelectronic properties of wide band gap doped microcrystalline silicon oxycarbide films produced by a TCDDC system [1].


2008 ◽  
Vol 93 (19) ◽  
pp. 192906 ◽  
Author(s):  
Varatharajan Anbusathaiah ◽  
Ching Jung Cheng ◽  
Sung Hwan Lim ◽  
Makoto Murakami ◽  
Lourdes G. Salamanca-Riba ◽  
...  

1983 ◽  
Vol 22 (4) ◽  
pp. 565-570 ◽  
Author(s):  
Fabrizio Cavani ◽  
Gabriele Centi ◽  
Italo Manenti ◽  
Alfredo Riva ◽  
Ferruccio Trifiro

1991 ◽  
Vol 243 ◽  
Author(s):  
Chi Kong Kwok ◽  
Seshu B. Desu

AbstractThe properties of ferroelectric thin films can be significantly influenced by the presence of point defects. The concentration of vacancies presented in these thin films is known to be one of the key parameters causing the degradation of these films when these films are subjected to polarization reversals.To study the effects of the vacancy concentration on the ferroelectric properties, sol gel PZT films and powders were annealed in different oxygen partial pressures. For the PZT films, the reduction of oxides to pure metals was not observed even with films annealed at 2×10−5 atmosphere of oxygen partial pressure. Samples annealed at low oxygen partial pressure (for instance, 10−3 and 2×10−5 atmosphere), which has more Pb and O2 depletions and consequently has more Pb and O2 vacancies, cannot be switched easily. The ratios of coercive field after and before fatigue increase as the defect concentrations of the annealed samples increase.


2008 ◽  
Vol 205 (8) ◽  
pp. 1957-1960
Author(s):  
P. Parreira ◽  
J. Valente ◽  
G. Lavareda ◽  
C. Nunes de Carvalho ◽  
A. R. Ramos ◽  
...  

1994 ◽  
Vol 336 ◽  
Author(s):  
R. Martins ◽  
I. Ferreira ◽  
E. Fortunato ◽  
M. Vieira

ABSTRACTSilicon oxycarbide microcrystalline layers, n- and p-doped, highly conductive and highly transparent have been produced using a Two Consecutive Decomposition and Deposition Chamber (TCDDC) system. The films exhibit suitable properties for optoelectronic applications where wide band gap materials with required conductivity and stability are needed. In this paper we present the role of partial oxygen pressure (po2) in controlling the composition, structure and transport properties (conductivity, σd and optical gap, Eop) of silicon oxycarbide microcrystalline layers.


1997 ◽  
Vol 22 (6) ◽  
pp. 1065-1073 ◽  
Author(s):  
Paola Palozza ◽  
Chiara Luberto ◽  
Gabriella Calviello ◽  
Paola Ricci ◽  
Gianna Maria Bartoli

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