Status of UV Imprint Lithography for Nanoscale Manufacturing

2017 ◽  
Author(s):  
T. Singh ◽  
S.V. Sreenivasan ◽  
J. Choi ◽  
P. Schumaker ◽  
F. Xu
Keyword(s):  
Imprint Lithography ◽  
Nanoscale Manufacturing

Nanoscale Manufacturing Enabled by Imprint Lithography

MRS Bulletin ◽  
2008 ◽  
Vol 33 (9) ◽  
pp. 854-863 ◽  
Author(s):  
S.V. Sreenivasan
Keyword(s):  
Integrated Circuits ◽  
Long Range ◽  
Building Blocks ◽  
Range Order ◽  
Magnetic Storage ◽  
Long Range Order ◽  
Imprint Lithography ◽  
Process Data ◽  
The Status ◽  
Nanoscale Manufacturing

AbstractImprint lithography has a remarkable patterning resolution of less than 5 nm, and it is simultaneously capable of patterning over large areas with long-range order. This combination enables a broad range of potential applications including terabit-density magnetic storage, CMOS integrated circuits, and nanowire molecular memory. This article provides a review of the status of imprint lithography for nanoscale manufacturing. First, representative nanoscale devices and their manufacturing requirements are reviewed, along with key patterning challenges that have to be overcome to enable these nanoscale applications. Two classes of top–down nanopatterning techniques, namely, photon-based lithography and proximity mechanical nanopatterning (including imprint lithography), are described, followed by the three primary building blocks of imprint lithography: imprint masks, tools, and materials. Theresults of the lithography process are detailed in terms of process data such as long-range order in the placement and size of the nanostructures, process throughput, and overall cost considerations.

Soft imprint lithography for liquid crystal alignment using a wrinkled UVO-treated PDMS transferring method

2021 ◽  
Vol 323 ◽  
pp. 115150
Author(s):  
Jung-Hyun Hwang ◽  
Jae-Sung Hong ◽  
Chan-Woo Oh ◽  
Min-Je Joe ◽  
Hae-Chang Jeong ◽  
...  
Keyword(s):  
Liquid Crystal ◽  
Imprint Lithography ◽  
Liquid Crystal Alignment ◽  
Crystal Alignment

Inspection and repair for imprint lithography at 32 nm and below

2009 ◽  
Author(s):  
Kosta Selinidis ◽  
Ecron Thompson ◽  
S. V. Sreenivasan ◽  
Douglas J. Resnick ◽  
Marcus Pritschow ◽  
...  
Keyword(s):  
Imprint Lithography

DNA-based self-assembly of nanostructures

2017 ◽  
Author(s):  
Joshua D. Carter ◽  
Chenxiang Lin ◽  
Yan Liu ◽  
Hao Yan ◽  
Thomas H. LaBean
Keyword(s):  
Self Assembly ◽  
Materials Science ◽  
Directed Assembly ◽  
Building Blocks ◽  
Hierarchical Assembly ◽  
Synthetic Dna ◽  
Nanoscale Manufacturing ◽  
Covalently Linked ◽  
Design Construction ◽  
Proteins And Peptides

This article examines the DNA-based self-assembly of nanostructures. It first reviews the development of DNA self-assembly and DNA-directed assembly, focusing on the main strategies and building blocks available in the modern molecular construction toolbox, including the design, construction, and analysis of nanostructures composed entirely of synthetic DNA, as well as origami nanostructures formed from a mixture of synthetic and biological DNA. In particular, it considers the stepwise covalent synthesis of DNA nanomaterials, unmediated assembly of DNA nanomaterials, hierarchical assembly, nucleated assembly, and algorithmic assembly. It then discusses DNA-directed assembly of heteromaterials such as proteins and peptides, gold nanoparticles, and multicomponent nanostructures. It also describes the use of complementary DNA cohesion as 'smart glue' for bringing together covalently linked functional groups, biomolecules, and nanomaterials. Finally, it evaluates the potential future of DNA-based self-assembly for nanoscale manufacturing for applications in medicine, electronics, photonics, and materials science.

scholarly journals Removal of Polymer for Nano-imprint Lithography using Atomic Hydrogen Generated by the Hot-wire Catalyzer

2011 ◽  
Vol 24 (4) ◽  
pp. 383-388 ◽  
Author(s):  
Akihiko Kono ◽  
Takashi Maruoka ◽  
Arai Yu ◽  
Yoshihiko Hirai ◽  
Hideo Horibe
Keyword(s):  
Atomic Hydrogen ◽  
Imprint Lithography ◽  
Hot Wire ◽  
Nano Imprint

Submicron Patterned Anodic Oxidation of Aluminum Thin Films

2000 ◽  
Vol 636 ◽  
Author(s):  
Qiyu Huang ◽  
Whye-Kei Lye ◽  
David M. Longo ◽  
Michael L. Reed
Keyword(s):  
Thin Films ◽  
Anodic Oxidation ◽  
Ion Beam ◽  
Electrochemical Anodization ◽  
Optical Methods ◽  
Imprint Lithography ◽  
Aluminum Films ◽  
Aspect Ratios ◽  
Potential Applications ◽  
Nano Imprint

AbstractAlumina formed by the electrochemical anodization of bulk aluminum has a regular porous structure [1]. Sub-100 nm pores with aspect ratios as high as 1000:1 can easily be formed [2] without elaborate processing. Anodization of aluminum thus provides the basis for the inexpensive, high throughput microfabrication of structures with near vertical sidewalls [2]. In this work we explore the patterned anodic oxidation of deposited aluminum thin films, facilitating the integration of this technique with established microfabrication tools. An anodization barrier of polymethylmethacrylate (PMMA) is deposited onto 300 nm thick aluminum films. The barrier film is subsequently patterned and the exposed aluminum anodized in a 10% sulfuric acid solution. Barrier patterning techniques utilized in this study include optical exposure, ion-beam milling and nano-imprint lithography. Sharp edge definition on micron scale patterns has been achieved using optical methods. Extension of this technique to smaller dimensions by ion-beam milling and nano-imprint lithography is presented. We further report on the observation of contrast reversal of anodization with very thin PMMA barriers, which provides a novel means of pattern transfer. Potential applications and challenges will be discussed.

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