Rotary pumps

Author(s):  
Maurice Stewart
Keyword(s):  
Author(s):  
G.K.W. Balkau ◽  
E. Bez ◽  
J.L. Farrant

The earliest account of the contamination of electron microscope specimens by the deposition of carbonaceous material during electron irradiation was published in 1947 by Watson who was then working in Canada. It was soon established that this carbonaceous material is formed from organic vapours, and it is now recognized that the principal source is the oil-sealed rotary pumps which provide the backing vacuum. It has been shown that the organic vapours consist of low molecular weight fragments of oil molecules which have been degraded at hot spots produced by friction between the vanes and the surfaces on which they slide. As satisfactory oil-free pumps are unavailable, it is standard electron microscope practice to reduce the partial pressure of organic vapours in the microscope in the vicinity of the specimen by using liquid-nitrogen cooled anti-contamination devices. Traps of this type are sufficient to reduce the contamination rate to about 0.1 Å per min, which is tolerable for many investigations.


Vacuum ◽  
1968 ◽  
Vol 18 (8) ◽  
pp. 445-449 ◽  
Author(s):  
MJ Fulker
Keyword(s):  

1914 ◽  
Vol 17 (33) ◽  
pp. 43-65
Author(s):  
I. Oki
Keyword(s):  

Materials ◽  
2019 ◽  
Vol 12 (19) ◽  
pp. 3238 ◽  
Author(s):  
Žiga Gosar ◽  
Denis Đonlagić ◽  
Simon Pevec ◽  
Janez Kovač ◽  
Miran Mozetič ◽  
...  

An industrial size plasma reactor of 5 m3 volume was used to study the deposition of silica-like coatings by the plasma-enhanced chemical vapor deposition (PECVD) method. The plasma was sustained by an asymmetrical capacitively coupled radio-frequency discharge at a frequency of 40 kHz and power up to 7 kW. Hexamethyldisilioxane (HMDSO) was introduced continuously at different flows of up to 200 sccm upon pumping with a combination of roots and rotary pumps at an effective pumping speed between 25 and 70 L/s to enable suitable gas residence time in the plasma reactor. The deposition rate and ion density were measured continuously during the plasma process. Both parameters were almost perfectly constant with time, and the deposition rate increased linearly in the range of HMDSO flows from 25 to 160 sccm. The plasma density was of the order of 1014 m−3, indicating an extremely low ionization fraction which decreased with increasing flow from approximately 2 × 10−7 to 6 × 10−8. The correlations between the processing parameters and the properties of deposited films are drawn and discussed.


1982 ◽  
Author(s):  
G. P. Balfour
Keyword(s):  

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