Performance of plasma deposited tungsten and tungsten nitride as thermally stable Schottky contact to GaAs

Control of Semiconductor Interfaces ◽

10.1016/b978-0-444-81889-8.50054-7 ◽

1994 ◽

pp. 295-300

Author(s):

Yong Tae Kim ◽

Suk-Ki Min ◽

Chang Woo Lee

Keyword(s):

Schottky Contact ◽

Tungsten Nitride ◽

Thermally Stable ◽

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Thermally stable visible-blind diamond photodiode using tungsten carbide Schottky contact

Applied Physics Letters ◽

10.1063/1.1992660 ◽

2005 ◽

Vol 87 (2) ◽

pp. 022105 ◽

Author(s):

Meiyong Liao ◽

Yasuo Koide ◽

Jose Alvarez

Keyword(s):

Tungsten Carbide ◽

Schottky Contact ◽

Thermally Stable ◽

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Tribological properties and oxidation resistance of tungsten and tungsten nitride films at temperatures up to 500 °C

Tribology International ◽

10.1016/j.triboint.2018.12.019 ◽

2019 ◽

Vol 132 ◽

pp. 211-220 ◽

Author(s):

D. Javdošňák ◽

J. Musil ◽

Z. Soukup ◽

S. Haviar ◽

R. Čerstvý ◽

...

Keyword(s):

Oxidation Resistance ◽

Tribological Properties ◽

Tungsten Nitride ◽

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Thermally stable TiN Schottky contact on AlGaN/GaN heterostructure

Vacuum ◽

10.1016/j.vacuum.2012.02.038 ◽

2013 ◽

Vol 87 ◽

pp. 150-154 ◽

Author(s):

Jin-Ping Ao ◽

Yoshiki Naoi ◽

Yasuo Ohno

Keyword(s):

Schottky Contact ◽

Thermally Stable ◽

Gan Heterostructure

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High‐temperature annealing characteristics of tungsten and tungsten nitride Schottky contacts to GaAs under different annealing conditions

Journal of Applied Physics ◽

10.1063/1.341847 ◽

1988 ◽

Vol 64 (3) ◽

pp. 1284-1291 ◽

Author(s):

Kin Man Yu ◽

J. M. Jaklevic ◽

E. E. Haller ◽

S. K. Cheung ◽

P. S. Kwok

Keyword(s):

High Temperature ◽

Schottky Contacts ◽

Tungsten Nitride ◽

High Temperature Annealing ◽

Annealing Conditions ◽

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Space-confined preparation of high surface area tungsten oxide and tungsten nitride inside the pores of mesoporous silica SBA-15

Microporous and Mesoporous Materials ◽

10.1016/j.micromeso.2015.03.003 ◽

2015 ◽

Vol 211 ◽

pp. 147-151 ◽

Author(s):

Simon Meyer ◽

Hans Beyer ◽

Klaus Köhler ◽

Annemette Hindhede Jensen ◽

Erik Christensen ◽

...

Keyword(s):

Mesoporous Silica ◽

Tungsten Oxide ◽

Surface Area ◽

High Surface ◽

High Surface Area ◽

Tungsten Nitride ◽

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Comment on “Thermally stable Ir Schottky contact on AlGaN/GaN heterostructure” [Appl. Phys. Lett. 82, 391 (2003)]

Applied Physics Letters ◽

10.1063/1.1598625 ◽

2003 ◽

Vol 83 (6) ◽

pp. 1272-1272 ◽

Author(s):

Yow-Jon Lin

Keyword(s):

Schottky Contact ◽

Thermally Stable ◽

Gan Heterostructure

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Characterization and properties of highly adhesive titanium nitride and tungsten nitride thin films

Journal of Physics Conference Series ◽

10.1088/1742-6596/113/1/012025 ◽

2008 ◽

Vol 113 ◽

pp. 012025 ◽

Author(s):

I N Martev ◽

D A Dechev ◽

N P Ivanov ◽

T D Uzunov ◽

E P Kashchieva

Keyword(s):

Titanium Nitride ◽

Tungsten Nitride ◽

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(Invited) Vanadium and Tungsten Nitride Thin Film Electrodes for Micro-Supercapacitors

ECS Meeting Abstracts ◽

10.1149/ma2018-02/3/165 ◽

2018 ◽

Keyword(s):

Thin Film ◽

Tungsten Nitride ◽

Thin Film Electrodes ◽

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Interface and electrical properties of plasma deposited tungsten and tungsten nitride Schottky contacts to GaAs

Journal of Applied Physics ◽

10.1063/1.357108 ◽

1994 ◽

Vol 76 (1) ◽

pp. 542-545 ◽

Author(s):

Yong Tae Kim ◽

Chang Woo Lee

Keyword(s):

Electrical Properties ◽

Schottky Contacts ◽

Tungsten Nitride ◽

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Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers

Electrochemical and Solid-State Letters ◽

10.1149/1.1924929 ◽

2005 ◽

Vol 8 (7) ◽

pp. G182 ◽

Author(s):

Zhengwen Li ◽

Roy G. Gordon ◽

Damon B. Farmer ◽

Youbo Lin ◽

Joost Vlassak

Keyword(s):

Diffusion Barriers ◽

Tungsten Nitride ◽

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