PHOTOELECTRON SPECTROSCOPY AND SCANNING PROBE MICROSCOPY OF PHTHALOCYANINES ON SILICON

Author(s):  
S. Santucci ◽  
L. Lozzi ◽  
L. Ottaviano
2013 ◽  
Vol 49 (89) ◽  
pp. 10446 ◽  
Author(s):  
Alex Pronschinske ◽  
Robert C. Bruce ◽  
Geoff Lewis ◽  
Yifeng Chen ◽  
Arrigo Calzolari ◽  
...  

2013 ◽  
Vol 1539 ◽  
Author(s):  
M. Letilly ◽  
K. Skorupska ◽  
M. Aggour ◽  
M. Kanis ◽  
H.-J. Lewerenz

ABSTRACTAnodic oxide formation and chemical and electrochemical etching of n-Si(111) have been investigated in alkaline media. Due to the complexity of the processes, the investigation has been restricted to the initial phase where a transitory anodic photocurrent peak is observed slightly positive from the open circuit potential (ocp). In-system photoelectron spectroscopy, performed at the U 49/2 beamline at Bessy, shows sub-monolayer silicon surface oxidation and remnant H-termination, indicating island-type oxide formation. Scanning probe microscopy shows the formation of macropores with 300-500 nm diameter and an average depth of 5-8 nm. The discussion comprises chemical and electrochemical dissolution mechanisms and routes to development of nanoemitter fuel generating devices.


ChemInform ◽  
2013 ◽  
Vol 45 (1) ◽  
pp. no-no
Author(s):  
Alex Pronschinske ◽  
Robert C. Bruce ◽  
Geoff Lewis ◽  
Yifeng Chen ◽  
Arrigo Calzolari ◽  
...  

Author(s):  
Kevin M. Shakesheff ◽  
Martyn C. Davies ◽  
Clive J. Roberts ◽  
Saul J. B. Tendler ◽  
Philip M. Williams

Author(s):  
Benedict Drevniok ◽  
St. John Dixon-Warren ◽  
Oskar Amster ◽  
Stuart L Friedman ◽  
Yongliang Yang

Abstract Scanning microwave impedance microscopy was used to analyze a CMOS image sensor sample to reveal details of the dopant profiling in planar and cross-sectional samples. Sitespecific capacitance-voltage spectroscopy was performed on different regions of the samples.


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