DEPTH DISTRIBUTIONS OF LOW ENERGY DEUTERIUM IMPLANTED INTO SILICON AS DETERMINED BY SIMS

1980 ◽  
pp. 383-387
Author(s):  
CHARLES W. MAGEE ◽  
SAMUEL A. COHEN ◽  
DONALD E. VOSS ◽  
DAVID K. BRICE
2018 ◽  
Vol 20 (4) ◽  
pp. 265-274
Author(s):  
F.F. Umarov ◽  
A.M. Rasulov ◽  
A.A. Dzhurakhalov

In the present work the peculiarities of ion implantation and colliding particles mass ratio influence on the ranges, energy loss and profiles of distribution for 1−5 keV P+ ions channelling in Si(110) and SiC(110) at normal incidence, and 1 keV Be+ and Se+ ions in GaAs(100), as well as 5 keV Ar+ and Kr+ on Cu(001) surface at glancing incidence are carried out by computer simulation in binary collision approximation. It is shown that for paraxial part of a beam the main contribution to the total energy loss comes from inelastic ones. It has been established that the energy loss of ions transmitted through thin crystal and depth profile distributions depend on width of the channel and mass ratio of colliding atoms. It was shown that at grazing surface channeling conditions the main peak of the implanted depth distributions is considerably shallow, the range for Se+ ions is shallower and the half-width of profile for these ions is narrow than that for Be+ ions. The results allow one to select the optimum for implanted depth distributions with demanded shape at narrow near-surface area of crystals obtaining.


2005 ◽  
Vol 908 ◽  
Author(s):  
Abdurauf Dzhurakhalov ◽  
Sirojiddin Rahmatov ◽  
Nigorakhon Teshabaeva ◽  
Maqsud Yusupov

AbstractThe ion sputtering and implantation into GaAs(001) surface at 1-5 keV Se+ grazing ion bombardment have been investigated by computer simulation.The azimuth angular dependencies of sputtering and penetration yield at grazing incidence have been calculated. It was observed that these dependencies correlate the crystal orientation. The depth distributions of 1-5 keV Se ions implanted into GaAs(001) for several azimuth angles of incidence have been presented.


A specially designed and characterized oil-free cryogenic UHV experimental system has been used to irradiate pre-thinned orientated copper and molybdenum single crystals at 4.2 and 78 K with very high doses (5 x 10 12 to 5 x 10 15 ions cm -2 ) of low-energy (0.2-20 keV) self-ions and xenon ions. Populations of dislocation loops were produced, after subsequent warm-up to room temperature, within a few hundred ångströms of the irradiated surface. The loop depth distributions were measured using stereo transmission electron microscope (TEM) techniques and correlated with possible displacement damage production and retention mechanisms, including replacement collision sequences (RCSS), incident ion channelling and near-surface loop losses. In copper, both near-surface vacancy-loop populations at depths up to about 100Å and deeper interstitial loops up to about 400Å in depth could be produced. In molybdenum only interstitial loops were visible, at depths up to about 250Å. The depth distributions depended critically on the incident ion mass, ion energy and the specimen surface orientation used. In all the copper and molybdenum irradiations at doses greater than 10 13 ions cm -2 only a very small fraction (not more than 2%) of the point defects theoretically created during the irradiations at 4.2 K were retained in visible loops after warm-up to room temperature. The results are consistent with displacement cascades, initiated by incident ions, injecting some interstitials along RCSS directed away from the irradiated surface, which may subsequently aggregate into interstitial loops. It is concluded that the loop depth distributions are determined more by the fraction of incident ions channelled at the irradiated surface than on RCS orientation effects relative to the surface. The low point defect retention efficiency in the present study is consistent with RCS ranges of only a few tens of ångströms at most. However, the lattice is highly damaged during the irradiation, possibly leading to enhanced RCS defocusing. Irradiation at 78K provides results consistent with interstitial mobility at this temperature.


1979 ◽  
Author(s):  
C.W. Magee ◽  
S.A. Cohen ◽  
D.E. Voss ◽  
D.K. Brice

1980 ◽  
Vol 168 (1-3) ◽  
pp. 383-387 ◽  
Author(s):  
Charles W. Magee ◽  
Samuel A. Cohen ◽  
Donald E. Voss ◽  
David K. Brice

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