Epitaxial Ti2AlN(0001) thin film deposition by dual-target reactive magnetron sputtering

Acta Materialia ◽

10.1016/j.actamat.2007.04.006 ◽

2007 ◽

Vol 55 (13) ◽

pp. 4401-4407 ◽

Author(s):

P.O.Å. Persson ◽

S. Kodambaka ◽

I. Petrov ◽

L. Hultman

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

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The influence of Ar-N/sub 2/ plasma conditions on GaN thin film deposition by reactive magnetron sputtering

3rd International Conference Novel Applications of Wide Bandgap Layers Abstract Book (Cat No 01EX500) WBL-01 ◽

10.1109/wbl.2001.946558 ◽

2002 ◽

Author(s):

B. Stanczyk ◽

A. Jagoda

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Thin film deposition by reactive magnetron sputtering: On the influence of target oxidation and its effect on surface properties

Thin Solid Films ◽

10.1016/s0040-6090(97)00157-0 ◽

1997 ◽

Vol 305 (1-2) ◽

pp. 164-171 ◽

Author(s):

D. Rohde ◽

H. Kersten ◽

C. Eggs ◽

R. Hippler

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Surface Properties ◽

Thin Film Deposition ◽

Film Deposition ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Plasma cathode—surface interaction in reactive magnetron sputtering for indium—tin-oxide thin film deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00246-6 ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 1286-1292 ◽

Author(s):

Y. Matsuda ◽

Y. Yamori ◽

S. Ohgushi ◽

M. Muta ◽

H. Fujiyama

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Cathode Surface ◽

Thin Film Deposition ◽

Film Deposition ◽

Oxide Thin Film ◽

Reactive Magnetron ◽

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Cu 2 Si x Sn 1− x S 3 Thin Films Prepared by Reactive Magnetron Sputtering For Low-Cost Thin Film Solar Cells

Chinese Physics Letters ◽

10.1088/0256-307x/28/10/108801 ◽

2011 ◽

Vol 28 (10) ◽

pp. 108801 ◽

Author(s):

Chang Yan ◽

Fang-Yang Liu ◽

Yan-Qing Lai ◽

Jie Li ◽

Ye-Xiang Liu

Keyword(s):

Thin Film ◽

Solar Cells ◽

Magnetron Sputtering ◽

Low Cost ◽

Reactive Magnetron Sputtering ◽

Thin Film Solar Cells ◽

Reactive Magnetron

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Effects of post-deposition plasma treatments on stability of amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/aaec18 ◽

2018 ◽

Vol 58 (SA) ◽

pp. SAAC03 ◽

Author(s):

Kosuke Takenaka ◽

Masashi Endo ◽

Giichiro Uchida ◽

Yuichi Setsuhara

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Transistors ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Plasma Treatments ◽

Post Deposition

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The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure

Nuclear Materials and Energy ◽

10.1016/j.nme.2016.12.031 ◽

2017 ◽

Vol 10 ◽

pp. 1-8 ◽

Author(s):

Y. Mao ◽

J. Engels ◽

A. Houben ◽

M. Rasinski ◽

J. Steffens ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Yttrium Oxide ◽

Reactive Magnetron Sputtering ◽

Oxide Thin Film ◽

Reactive Magnetron

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Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2018.11.058 ◽

2019 ◽

Vol 160 ◽

pp. 410-417 ◽

Author(s):

D.L. Ma ◽

H.Y. Liu ◽

Q.Y. Deng ◽

W.M. Yang ◽

K. Silins ◽

...

Keyword(s):

Thin Film ◽

Aluminum Nitride ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Optimal Target ◽

Pulsed Magnetron

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Indium–tin-oxide thin film prepared by microwave-enhanced d.c. reactive magnetron sputtering for telecommunication wavelengths

Thin Solid Films ◽

10.1016/s0040-6090(02)00894-5 ◽

2002 ◽

Vol 422 (1-2) ◽

pp. 80-86 ◽

Author(s):

Li-Jian Meng ◽

Eddie Crossan ◽

Andrei Voronov ◽

Frank Placido

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Oxide Thin Film ◽

Reactive Magnetron

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PZT thin film deposition on Si wafers and optical fibers prepared by reactive DC pulsed magnetron sputtering from a single metallic target

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.03.014 ◽

2005 ◽

Vol 200 (1-4) ◽

pp. 1051-1056 ◽

Author(s):

R. Thapliyal ◽

P. Schwaller ◽

M. Amberg ◽

F.J. Haug ◽

G. Fortunato ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Optical Fibers ◽

Thin Film Deposition ◽

Film Deposition ◽

Pzt Thin Film ◽

Metallic Target ◽

Pulsed Magnetron

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Optimal magnetron sputtering parameters for superconducting NbN thin film deposition

Vacuum ◽

10.1016/0042-207x(93)90319-6 ◽

1993 ◽

Vol 44 (8) ◽

pp. 847-850 ◽

Author(s):

EK Hollmann ◽

AG Zaitsev

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition

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