The influence of Ar-N/sub 2/ plasma conditions on GaN thin film deposition by reactive magnetron sputtering

2002 ◽  
Author(s):  
B. Stanczyk ◽  
A. Jagoda
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 160 ◽  
pp. 410-417 ◽  
Author(s):  
D.L. Ma ◽  
H.Y. Liu ◽  
Q.Y. Deng ◽  
W.M. Yang ◽  
K. Silins ◽  
...  
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimal Target ◽  
Pulsed Magnetron
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