Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum
2010 ◽
Vol 256
(14)
◽
pp. 4745-4756
◽
1991 ◽
Vol 30
(Part 1, No. 8)
◽
pp. 1609-1612
◽
2000 ◽
Vol 7
(1)
◽
pp. 12
2021 ◽
Vol 15
(6)
◽
pp. 2170024