Non-destructive elemental depth profiling of Ni/Ti multilayers by GIXRF technique

2021 ◽  
Vol 542 ◽  
pp. 148733
Author(s):  
A. Biswas ◽  
N. Abharana ◽  
S.N. Jha ◽  
D. Bhattacharyya
Keyword(s):  
Depth Profiling ◽  
Non Destructive ◽  
Elemental Depth

scholarly journals Accurate electronics calibration for particle backscattering spectrometry

2015 ◽  
Vol 7 (7) ◽  
pp. 3096-3104 ◽  
Author(s):  
Julien L. Colaux ◽  
Chris Jeynes
Keyword(s):  
Rutherford Backscattering Spectrometry ◽  
Depth Profiling ◽  
Pulse Height ◽  
Absolute Accuracy ◽  
Analytical Technique ◽  
First Order ◽  
System P ◽  
Particle Backscattering ◽  
Non Destructive ◽  
Elemental Depth

Rutherford backscattering spectrometry (RBS) is a non-destructive thin film analytical technique of the highest absolute accuracy which, when used for elemental depth profiling, depends at first order on the gain of the pulse-height spectrometry system.

Non-destructive elemental depth-profiling with muonic X-rays

2008 ◽  
Vol 278 (3) ◽  
pp. 777-781 ◽  
Author(s):  
M. K. Kubo ◽  
H. Moriyama ◽  
Y. Tsuruoka ◽  
S. Sakamoto ◽  
E. Koseto ◽  
...  
Keyword(s):  
Depth Profiling ◽  
X Rays ◽  
Non Destructive ◽  
Elemental Depth

The Prs2O3 /Si(001) Interface: a Mixed Si-Pr Oxide

2003 ◽  
Vol 765 ◽  
Author(s):  
Dieter Schmeißer ◽  
Jarek Dabrowski ◽  
Hans-Joachim Müssig
Keyword(s):  
Depth Profiling ◽  
Dielectric Materials ◽  
Interface Properties ◽  
Silicide Formation ◽  
Silicate System ◽  
No Formation ◽  
Interface Characteristics ◽  
Reactive Interface ◽  
Non Destructive ◽  
Natural Way

AbstractWe studied the Pr2O3/Si(001) interface by a non-destructive depth profiling using synchrotron radiation and photo-electron spectroscopy (SR-PES) at the undulator beam line U49/2-PGM2 and ab initio calculations. Our results provide evidence that a chemical reactive interface exists consisting of a mixed Si-Pr oxide such as (Pr2O3)(SiO)x(SiO2)y. There is no formation of neither an interfacial SiO2 nor interfacial silicide: all Si-Pr bonds are oxidized and all SiO4 units dissolve in the Pr oxide. Under ultrahigh vacuum conditions, silicide formation is observed only when the film is heated above 800°C in vacuum. Interfacial silicates like (Pr2O3)(SiO)x(SiO2)y are promising high-k dielectric materials, e.g., because they represent incremental modification of SiO2 films by Pr ions, so that the interface characteristics can be similar to Si-SiO2 interface properties. The Pr silicate system formed in a natural way at the interface between Si(001) and Pr2O3 offers an increased flexibility towards integration of Pr2O3 into future CMOS technologies.

scholarly journals An overview on the non-destructive in-depth surface analysis of corrosion-resistant films: A case study of W-xCr deposits in 12 M HCl solution

BIBECHANA ◽  
2021 ◽  
Vol 18 (1) ◽  
pp. 201-213
Author(s):  
Jagadish Bhattarai
Keyword(s):  
Corrosion Resistance ◽  
Depth Profiling ◽  
Surface Films ◽  
High Corrosion Resistance ◽  
Corrosion Rates ◽  
High Corrosion ◽  
Depth Analysis ◽  
Sputter Deposited ◽  
Non Destructive ◽  
Hcl Solution

Non-destructive in-depth analysis of the surface films formed on the sputter-deposited binary W-xCr (x = 25, 57, 91 at %) alloys in 12 M HCl solution open to air at 30 °C was investigated using an angle-resolved X-ray photoelectron spectroscopic (AR-XPS) technique to understand the synergistic corrosion resistance effects of showing very low corrosion rates, even lower than both alloying metals of the deposits. The average corrosion rates of these three tungsten-based sputter deposits found to be more than five orders of magnitude (between 3.1 × 10−3 and 7.2 × 10−3 mm/y) to that of chromium and also nearly one order of magnitude lower than that of tungsten metals. Such high corrosion resistance of the sputter-deposited W-xCr alloys is due to the formation of homogeneous passive double oxyhydroxide film consisting of Wox and Cr4+ cations without any concentration gradient in-depth after immersion in 12 M HCl solution open to air at 30 °C from the study of the non-destructive depth profiling technique of AR-XPS. Consequently, both alloying elements of tungsten and niobium are acted synergistically in enhancing high corrosion resistance properties of the alloys in such aggressive electrolyte. BIBECHANA 18 (2021) 201-213

Confocal Raman imaging and chemometrics applied to solve forensic document examination involving crossed lines and obliteration cases by a depth profiling study

The Analyst ◽  
2017 ◽  
Vol 142 (7) ◽  
pp. 1106-1118 ◽  
Author(s):  
Flávia de Souza Lins Borba ◽  
Tariq Jawhari ◽  
Ricardo Saldanha Honorato ◽  
Anna de Juan
Keyword(s):  
Analytical Method ◽  
Depth Profiling ◽  
Raman Imaging ◽  
Confocal Raman ◽  
Document Examination ◽  
Non Destructive

This article describes a non-destructive analytical method developed to solve forensic document examination problems involving crossed lines and obliteration.

Non-Destructive Fluorine Depth Profiling as Quality Assurance for the Oxidation Protection of TiAl Turbine Blades

2010 ◽  
Vol 638-642 ◽  
pp. 1384-1389 ◽  
Author(s):  
Sven Neve ◽  
Kurt Stiebing ◽  
Lothar P.H. Schmidt ◽  
Hans Eberhard Zschau ◽  
Patrick J. Masset ◽  
...  
Keyword(s):  
Quality Assurance ◽  
Ion Beam ◽  
Turbine Blades ◽  
Depth Profiling ◽  
Temperature Oxidation ◽  
Beam Analysis ◽  
Before And After ◽  
First Time ◽  
Non Destructive ◽  
Mass Increase

Using the halogen effect TiAl-alloys can be protected against high-temperature oxidation. Two different fluorination methods were applied to turbine blades. The mass increase due to oxidation can be drastically reduced compared to untreated specimen. A new vacuum chamber for ion beam analysis was developed to analyze the real parts. Using PIGE-technique the F-content as a function of depth before and after oxidation was detected. Thickness and composition of the oxide scale were measured by RBS. Both ion beam methods were non destructive and thus enabled for the first time quality assurance of the halogen treatment on real components.

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