Nanoindentation-induced deformation behaviors of tetrahedral amorphous carbon film deposited by cathodic vacuum arc with different substrate bias voltages
1998 ◽
Vol 7
(2-5)
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pp. 640-644
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2007 ◽
Vol 201
(9-11)
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pp. 4995-4998
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Modification of tetrahedral amorphous carbon film by concurrent Ar ion bombardment during deposition
1998 ◽
Vol 105
(1-2)
◽
pp. 91-96
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Keyword(s):
1999 ◽
Vol 120-121
◽
pp. 579-584
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Keyword(s):
Keyword(s):
Keyword(s):
2007 ◽
Vol 73
(4)
◽
pp. 470-474
Keyword(s):