Electrical and optical properties of Si-doped indium tin oxides as transparent electrode and anti-reflection coating for solar cells

2015 ◽  
Vol 15 (7) ◽  
pp. 794-798 ◽  
Author(s):  
Gyujin Oh ◽  
Kyoung Su Lee ◽  
Eun Kyu Kim
2019 ◽  
Vol 21 (21) ◽  
pp. 11306-11312 ◽  
Author(s):  
Hao Ren ◽  
Xingang Ren ◽  
Zhixiang Huang ◽  
Xianliang Wu

We have established new dual light trapping structures that improve the electrical and optical properties of OSCs.


2010 ◽  
Vol 114 (48) ◽  
pp. 20713-20718 ◽  
Author(s):  
Hyeunseok Cheun ◽  
Canek Fuentes-Hernandez ◽  
Yinhua Zhou ◽  
William J. Potscavage ◽  
Sung-Jin Kim ◽  
...  

2018 ◽  
Vol 531 ◽  
pp. 9-15 ◽  
Author(s):  
Huafei Guo ◽  
Yan Li ◽  
Xiaohai Guo ◽  
Ningyi Yuan ◽  
Jianning Ding

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 329 ◽  
Author(s):  
Dong Shin ◽  
Suk-Ho Choi

It is necessary to develop semitransparent photovoltaic cell for increasing the energy density from sunlight, useful for harvesting solar energy through the windows and roofs of buildings and vehicles. Current semitransparent photovoltaics are mostly based on Si, but it is difficult to adjust the color transmitted through Si cells intrinsically for enhancing the visual comfort for human. Recent intensive studies on translucent polymer- and perovskite-based photovoltaic cells offer considerable opportunities to escape from Si-oriented photovoltaics because their electrical and optical properties can be easily controlled by adjusting the material composition. Here, we review recent progress in materials fabrication, design of cell structure, and device engineering/characterization for high-performance/semitransparent organic and perovskite solar cells, and discuss major problems to overcome for commercialization of these solar cells.


2007 ◽  
Vol 124-126 ◽  
pp. 131-134
Author(s):  
Doo Soo Kim ◽  
Byeong Yun Oh ◽  
Min Chang Jeong ◽  
Jae Min Myoung

Al-doped ZnO (ZnO:Al) films for transparent electrode applications in dye-sensitized solar cells and thin film solar cells were fabricated and characterized. In order to investigate the effect of crystallinity of the ZnO:Al films to the morphology and optical properties of the etched surface, the ZnO:Al films were deposited with varying substrate temperature by rf magnetron sputtering system and then films’ surface was etched in diluted hydrochloric acid (HCl) solution. Surface morphology of the amorphous ZnO:Al film deposited at room temperature was controllable to have large surface area, but it was not appropriate for transparent electrode layers due to high electrical resistivity. However, the resistivities of the ZnO:Al films deposited at the substrate temperatures of 150 and 300 oC were as low as 1.50×10-3 cm. In addition, the surface morphologies of the films deposited at 150 and 300 oC showed larger surface area for dye-sensitized cells and crater shape for light diffusion through the films, respectively. The surface morphologies and optical properties of the etched ZnO:Al films are attributed to the crystallinity of the as-fabricated films.


1983 ◽  
Vol 47 (3) ◽  
pp. 195-198 ◽  
Author(s):  
O.P. Agnihotri ◽  
M.T. Mohammad ◽  
A.K. Abass ◽  
K.I. Arshak

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