Surface temperature jump beyond active oxidation of carbon/silicon carbide composites in extreme aerothermal conditions

Carbon ◽  
2014 ◽  
Vol 71 ◽  
pp. 102-119 ◽  
Author(s):  
Francesco Panerai ◽  
Bernd Helber ◽  
Olivier Chazot ◽  
Marianne Balat-Pichelin
2016 ◽  
Vol 36 (15) ◽  
pp. 3697-3707 ◽  
Author(s):  
David L. Poerschke ◽  
Mark D. Novak ◽  
Najeb Abdul-Jabbar ◽  
Stephan Krämer ◽  
Carlos G. Levi

2000 ◽  
Vol 619 ◽  
Author(s):  
Da-Jiang Liu ◽  
Cheol Ho Choi ◽  
Mark S. Gordon ◽  
J.W. Evans

ABSTRACTFor a Si(100)2×1 surface exposed to oxygen, there is a transition from etching (“active” oxidation via removal of SiO) to “passive” oxidation (buildup of an oxide film) with decreasing surface temperature. The transition depends sensitively on a competition between SiO desorption, and oxide island formation. We analyze these processes utilizing both ab-initio quantum chemistry studies of key energetics and lattice-gas models for the cooperative behavior.


2012 ◽  
Vol 29 (3) ◽  
pp. 193-198 ◽  
Author(s):  
Nathan S. Jacobson ◽  
Dwight L. Myers ◽  
Bryan J. Harder

2015 ◽  
Vol 1128 ◽  
pp. 149-155 ◽  
Author(s):  
Muna Noori ◽  
Mihai Chisamera ◽  
Hazim Faleh ◽  
Florin Ştefănescu ◽  
Gigel Neagu

The paper is a synthesis of essential data regarding the wetting conditions in aluminium – silicon carbide mixtures. Non wetting conditions between the reinforcing element and the matrix turns difficult the incorporation of particles in the aluminium melt. The wettability depends on several elements, like the presence of the oxide layer at the melt surface, temperature, pressure or shape of the complementary material. To improve wetting conditions, several measures are necessary: alloying of the melt with surface active elements, overheating of the melt; coating of the particles with a metallic thin layer. Also, by using existing data reported in the field, some parameters were calculated and interpreted.


1993 ◽  
Vol 76 (10) ◽  
pp. 2521-2524 ◽  
Author(s):  
Takayuki Narushima ◽  
Takashi Goto ◽  
Yoshio Yokoyama ◽  
Yasutaka Iguchi ◽  
Toshio Hirai

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