Eight mole percent yttria stabilized zirconia powders by organic precursor route

2008 ◽  
Vol 34 (5) ◽  
pp. 1195-1199 ◽  
Author(s):  
D.S. Patil ◽  
K. Prabhakaran ◽  
Rajiv Dayal ◽  
C. Durga Prasad ◽  
N.M. Gokhale ◽  
...  
1991 ◽  
Vol 26 (14) ◽  
pp. 3787-3791 ◽  
Author(s):  
T. L. Wen ◽  
V. Hebert ◽  
S. Vilminot ◽  
J. C. Bernier

2004 ◽  
Vol 298 (1) ◽  
pp. 289-296 ◽  
Author(s):  
A. M. Slipenyuk ◽  
M. D. Glinchuk ◽  
I. P. Bykov ◽  
A. V. Ragulya ◽  
V. P. Klimenko ◽  
...  

2004 ◽  
Vol 460 (1-2) ◽  
pp. 101-115 ◽  
Author(s):  
J.F Li ◽  
H Liao ◽  
X.Y Wang ◽  
C Coddet ◽  
H Chen ◽  
...  

1999 ◽  
Vol 14 (1) ◽  
pp. 12-15 ◽  
Author(s):  
John A. Belot ◽  
Richard J. McNeely ◽  
Anchuan Wang ◽  
Charles J. Reedy ◽  
Tobin J. Marks ◽  
...  

This communication reports rapid, efficient syntheses of the zirconium-organic metal-organic chemical vapor deposition (MOCVD) precursors Zr(acac)4 and Zr(dpm)4 (acac = acetylacetonate; dpm = dipivaloylmethanate) as well as a new, highly volatile, air- and moisture-stable Zr precursor based on a tetradentate Schiff-base ligand, Zr(tfacen)2 (tfacen = bis-trifluoroacetylacetone-ethylenediiminate). The improved one-step synthetic routes employ tetrakis(dimethylamido)zirconium as a common intermediate and represent a major advance over previous methods employing ZrCl4 or diketonate metathesis. Furthermore, Zr(tfacen)2 is shown to be an effective metal-organic precursor for the MOCVD-mediated growth of (100) oriented yttria-stabilized zirconia thin films.


1996 ◽  
Vol 22 (2) ◽  
pp. 123-130 ◽  
Author(s):  
Rongde Ge ◽  
Zhihong Liu ◽  
Huiguang Chen ◽  
Duomo Zhang ◽  
Tiancong Zhao

2012 ◽  
Vol 116 (17) ◽  
pp. 9762-9768 ◽  
Author(s):  
Vera P. Pakharukova ◽  
Ella M. Moroz ◽  
Dmitry A. Zyuzin ◽  
Vladimir I. Zaikovskii ◽  
Fedor V. Tuzikov ◽  
...  

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